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公开(公告)号：US20130196580A1
公开(公告)日：2013-08-01
申请号：US13769029
申请日：2013-02-15
Applicant: LG Chem, Ltd.
Inventor： Kyoung-Hoon MIN , Ye-Hoon Im , Dae-Yeon Lee , Jae-Ik Song , Su-Chan Park
IPC: B24B37/26
CPC classification number: B24B37/26
Abstract: A polishing pad of a polishing system is mountable to a polishing plate and has a predetermined channel pattern so as to allow a polishing liquid supplied from a polishing liquid supplier to move on a polishing surface. The channel pattern has at least two kinds of patterns.
Abstract translation: 抛光系统的抛光垫可安装到抛光板上并具有预定的通道图案，以使得抛光液供应商提供的抛光液体能够在抛光表面上移动。 通道图案至少有两种图案。
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公开(公告)号：US09962726B2
公开(公告)日：2018-05-08
申请号：US14287758
申请日：2014-05-27
Applicant: LG CHEM, LTD.
Inventor： WonChan Park , De-Hee Kim , Ye-Hoon Im
Abstract: A dipping bath according to the present disclosure includes a body to hold a slurry for dip coating, an inlet installed to flow the slurry from an outside of the body to an inside, and an outlet installed to discharge the slurry from the inside of the body to the outside, and one end of the inlet placed inside the body may be disposed facing a side surface of the body at a distance and may be tilted to a predetermined angle in a direction toward a bottom surface of the body.According to the present disclosure, adjustment of an incidence angle of the slurry flowing into the bath through the inlet may increase a flow rate of the slurry toward the bottom surface, as well as allowing a uniform distribution of solids contained in the slurry circulating through the bath.
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3.发明授权公开(公告)号：US09862631B2
公开(公告)日：2018-01-09
申请号：US14426909
申请日：2014-09-03
Applicant: LG CHEM, LTD.
Inventor： Kyoung-Hoon Min , Ye-Hoon Im , Won-Jae Moon , Ji-Seob Lee
CPC classification number: C03B5/18 , C03B5/20 , C03B5/245 , C03B5/262 , C03B5/265 , C03B5/267 , Y02P40/57
Abstract: The present disclosure provides an apparatus for eliminating a heterogeneous glass present in the top surface of a molten glass effectively, and a melting furnace and a glass manufacturing apparatus comprising the same. The apparatus for eliminating a heterogeneous glass according to one aspect of the present disclosure comprises a storage bath having an inlet and an outlet to receive a molten glass fed into the inlet and to discharge the received molten glass through the outlet, and an evacuating opening formed on the top of the storage bath, the evacuating opening allowing the received molten glass to overflow; a first gate being mounted close to the outlet of the storage bath to adjust an open area, thereby controlling the flow rate of the molten glass to be discharged through the outlet; and a second gate being mounted close to the inlet of the storage bath to control the height of the molten glass received in the storage bath at the section in which the evacuating opening is formed.
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公开(公告)号：US09718719B2
公开(公告)日：2017-08-01
申请号：US14189522
申请日：2014-02-25
Applicant: LG CHEM, LTD.
Inventor： Kyoung-Hoon Min , Ye-Hoon Im , Su-Chan Park , Sang-Oeb Na , Won-Jae Moon
Abstract: Disclosed is a float bath which allows easy temperature control according to an internal position, and a glass manufacturing apparatus and glass manufacturing method including the float bath. The float bath includes a plurality of heaters provided at an upper portion of the float bath to supply heat into the float bath, and a shield provided between predetermined heaters among the plurality of heaters to block heat transfer therebetween.
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公开(公告)号：US09943887B2
公开(公告)日：2018-04-17
申请号：US13768996
申请日：2013-02-15
Applicant: LG CHEM, LTD.
Inventor： Young Ju Seo , Chae-Ho Chung , Do-Ki Chang , Ki-Kyo Yeom , Ye-Hoon Im , Jae-Min Kim , Kyoung-Hoon Min , Won-Chan Park
Abstract: A fluid supplying apparatus includes an inner tube having a plurality of holes for distributing a fluid supplied from a supply unit, and an outer tube arranged coaxially or non-coaxially with the inner tube to surround the inner tube and having a plurality of slots for injecting the fluid distributed therein from the holes to the outside. The outer tube substantially has the same length as the inner tube. The fluid supplying apparatus may be used for a thin film cleaning system or method.
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Patent Agency Ranking
公开(公告)号：US08667704B2
公开(公告)日：2014-03-11
申请号：US13735625
申请日：2013-01-07
Applicant: LG Chem, Ltd.
Inventor： Su-Chan Park , Ye-Hoon Im , Kyoung-Hoon Min
IPC: F26B9/00
CPC classification number: B08B5/023 , H01L21/67028 , H01L21/67034 , H01L21/67173 , H01L21/6776
Abstract: Disclosed is an air knife chamber constructed such that water flowing down along a partition wall is allowed to fall in front of a slit. Due to this construction, the water can be effectively removed by air knives, thus contributing to a reduction in the defective proportion of substrates.
Abstract translation: 公开了一种气刀室，其构造成使得沿着分隔壁向下流动的水被允许落在狭缝的前面。 由于这种结构，可以通过气刀有效地除去水，从而有助于减少基板的不良比例。
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公开(公告)号：US08647178B2
公开(公告)日：2014-02-11
申请号：US13769029
申请日：2013-02-15
Applicant: LG Chem, Ltd.
Inventor： Kyoung-Hoon Min , Ye-Hoon Im , Dae-Yeon Lee , Jae-Ik Song , Su-Chan Park
IPC: B24D11/00
CPC classification number: B24B37/26
Abstract: A polishing pad of a polishing system is mountable to a polishing plate and has a predetermined channel pattern so as to allow a polishing liquid supplied from a polishing liquid supplier to move on a polishing surface. The channel pattern has at least two kinds of patterns.
Abstract translation: 抛光系统的抛光垫可安装到抛光板上并具有预定的通道图案，以使得抛光液供应商提供的抛光液体能够在抛光表面上移动。 通道图案至少有两种图案。
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公开(公告)号：US10361470B2
公开(公告)日：2019-07-23
申请号：US15548372
申请日：2016-02-04
Applicant: LG CHEM, LTD.
Inventor： Ki-Young Kwon , Da-Young Sung , Young-Jin Yi , Min-Chul Jang , Byoung-Hyo Jung , Ye-Hoon Im , Doo-Kyung Yang
IPC: H01M10/50 , H01M10/658 , H01M10/615 , H01M10/625 , H01M10/627 , H01M10/63 , H01M10/6554 , H01M2/02 , H01M10/48 , H01M2/10 , H01M10/0562 , H01M10/0525 , H01M10/052 , H01M10/647
Abstract: A cartridge having a novel structure for guaranteeing stable operational performance of a secondary battery that operates at a high temperature or has improved performance at a high temperature, and a battery module including the cartridge is provided. The battery module includes at least one secondary battery; and a cartridge receiving at least a portion of the secondary battery and configured to be stacked in at least one direction, the cartridge including a heat insulating member.
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9.发明申请公开(公告)号：US20130149939A1
公开(公告)日：2013-06-13
申请号：US13753147
申请日：2013-01-29
Applicant: LG Chem, Ltd.
Inventor： Kyoung-Hoon Min , Ye-Hoon Im , Dae-Yeon Lee , Jae-Ik Song , Su-Chan Park
CPC classification number: B24B7/00 , B24B37/005 , B24B37/042 , B24B49/00
Abstract: Disclosed is a substrate polishing method capable of minimizing a difference of polishing amounts between a center portion and a rim portion of a large scale plate during a plate polishing process.
Abstract translation: 公开了一种基板研磨方法，其能够最小化板研磨工序中的大型板的中心部和边缘部之间的抛光量的差异。
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公开(公告)号：US09598302B2
公开(公告)日：2017-03-21
申请号：US14480217
申请日：2014-09-08
Applicant: LG CHEM, LTD
Inventor： Kyoung-Hoon Min , Ye-Hoon Im , Su-Chan Park
IPC: C03B18/06
CPC classification number: C03B18/06
Abstract: The present disclosure discloses a float bath that may enhance spreadability of a poured glass melt when pouring the glass melt, an apparatus for manufacturing a float glass comprising the same, a method for manufacturing a float glass using the float bath, and a float glass produced by the method. The float bath according to the present disclosure receives a metal melt and allows a glass melt poured onto the metal melt to float and move from upstream to downstream, and includes a guiding unit provided at a part where the glass melt is poured, to come into contact with the side of the poured glass melt to guide a sidewise spreading path of the glass melt to expand sidewise spreading of the glass melt.
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