- Patent Title: Multilayer optical films suitable for bi-level internal patterning
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Application No.: US14661803Application Date: 2015-03-18
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Publication No.: US09964677B2Publication Date: 2018-05-08
- Inventor: William W. Merrill , Douglas S. Dunn , Przemyslaw Pawel Markowicz
- Applicant: 3M INNOVATIVE PROPERTIES COMPANY
- Applicant Address: US MN Saint Paul
- Assignee: 3M INNOVATIVE PROPERTIES COMPANY
- Current Assignee: 3M INNOVATIVE PROPERTIES COMPANY
- Current Assignee Address: US MN Saint Paul
- Agent Gregory D. Allen
- Main IPC: G02B27/28
- IPC: G02B27/28 ; G02B5/30 ; G02B5/08 ; G02B5/28 ; B42D25/23 ; B42D25/24 ; B42D25/391 ; G02F1/1335 ; G02F1/13363

Abstract:
A reflective film includes a first optical stack that provides a first reflective characteristic and a second optical stack that provides a second reflective characteristic. The optical stacks also have first and second absorptive characteristics that are suitable to absorptively heat the respective stacks upon exposure to light including a write wavelength while maintaining the structural integrity of the stacks. The absorptive heating can change the first and second reflective characteristics to third and fourth reflective characteristics, respectively. A blocking layer that at least partially blocks light of the write wavelength may also be provided between the optical stacks to permit absorptive heating of any selected one of the optical stacks. The reflective characteristics of the optical stacks can thus be independently modified in any desired patterns by appropriate delivery of light beams that include the write wavelength.
Public/Granted literature
- US20150192719A1 MULTILAYER OPTICAL FILMS SUITABLE FOR BI-LEVEL INTERNAL PATTERNING Public/Granted day:2015-07-09
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