Invention Grant
- Patent Title: Semiconductor inspection and metrology system using laser pulse multiplier
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Application No.: US15176346Application Date: 2016-06-08
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Publication No.: US09972959B2Publication Date: 2018-05-15
- Inventor: Yung-Ho Chuang , J. Joseph Armstrong , Justin Dianhuan Liou , Vladimir Dribinski , David L. Brown
- Applicant: KLA-Tencor Corporation
- Applicant Address: US CA Milpitas
- Assignee: KLA-Tencor Corporation
- Current Assignee: KLA-Tencor Corporation
- Current Assignee Address: US CA Milpitas
- Agency: Bever, Hoffman & Harms, LLP
- Main IPC: G02B5/30
- IPC: G02B5/30 ; H01S3/00 ; G02B27/28 ; H01S3/083 ; G01N21/21 ; G01N21/95 ; G02B5/08

Abstract:
A pulse multiplier includes a polarizing beam splitter, a wave plate, and a set of multi-surface reflecting components (e.g., one or more etalons and one or more mirrors). The polarizing beam splitter passes input laser pulses through the wave plate to the multi-surface reflecting components, which reflect portions of each input laser pulse back through the wave plate to the polarizing beam splitter. The polarizing beam splitter reflects each reflected portion to form an output of the pulse multiplier. The multi-surface reflecting components are configured such that the output pulses exiting the pulse multiplier have an output repetition pulse frequency rate that is at least double the input repetition pulse frequency.
Public/Granted literature
- US20160285223A1 Semiconductor Inspection And Metrology System Using Laser Pulse Multiplier Public/Granted day:2016-09-29
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