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公开(公告)号:US10439355B2
公开(公告)日:2019-10-08
申请号:US15901388
申请日:2018-02-21
Applicant: KLA-Tencor Corporation
Inventor: Yung-Ho Chuang , J. Joseph Armstrong , Yujun Deng , Justin Dianhuan Liou , Vladimir Dribinski , John Fielden
IPC: G01N21/95 , G02B17/08 , H01S3/23 , H01S3/00 , H01S3/30 , H01S3/10 , H01S3/067 , H01S3/16 , H01S3/11 , G02F1/35 , G02F1/39
Abstract: An optical inspection system that utilizes sub-200 nm incident light beam to inspect a surface of an object for defects is described. The sub-200 nm incident light beam is generated by combining first light having a wavelength of about 1109 nm with second light having a wavelength of approximately 234 nm. An optical system includes optical components configured to direct the incident light beam to a surface of the object, and image relay optics are configured to collect and relay at least two channels of light to a sensor, where at least one channel includes light reflected from the object, and at least one channel includes light transmitted through the object. The sensor is configured to simultaneously detect both the reflected and transmitted light. A laser for generating the sub-200 nm incident light beam includes a fundamental laser, two or more harmonic generators, a frequency doubler and a two frequency mixing stages.
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公开(公告)号:US09935421B2
公开(公告)日:2018-04-03
申请号:US15344383
申请日:2016-11-04
Applicant: KLA-Tencor Corporation
Inventor: Yung-Ho Chuang , J. Joseph Armstrong , Yujun Deng , Justin Dianhuan Liou , Vladimir Dribinski , John Fielden
IPC: H01S3/10 , H01S3/30 , G02B17/08 , H01S3/00 , G01N21/95 , H01S3/067 , H01S3/23 , H01S3/16 , H01S3/11 , G02F1/35 , G02F1/39
CPC classification number: H01S3/302 , G01N21/9501 , G02B17/0892 , G02F1/353 , G02F1/395 , G02F2001/354 , H01S3/005 , H01S3/0092 , H01S3/067 , H01S3/06754 , H01S3/10053 , H01S3/11 , H01S3/16 , H01S3/1643 , H01S3/1666 , H01S3/23 , H01S3/2308
Abstract: An improved solid-state laser for generating sub-200 nm light is described. This laser uses a fundamental wavelength between about 1030 nm and 1065 nm to generate the sub-200 nm light. The final frequency conversion stage of the laser creates the sub-200 nm light by mixing a wavelength of approximately 1109 nm with a wavelength of approximately 234 nm. By proper selection of non-linear media, such mixing can be achieved by nearly non-critical phase matching. This mixing results in high conversion efficiency, good stability, and high reliability.
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公开(公告)号:US20170323716A1
公开(公告)日:2017-11-09
申请号:US15659981
申请日:2017-07-26
Applicant: KLA-Tencor Corporation
Inventor: Yung-Ho Alex Chuang , J. Joseph Armstrong , Yujun Deng , Vladimir Dribinski , John Fielden , Jidong Zhang
CPC classification number: H01F17/0006 , G01N21/9501 , G01N21/956 , G01N2021/95676 , G02B21/10 , G02B21/16 , G02B21/361 , G02F1/353 , G02F2001/3507 , G02F2001/354 , H01F17/04 , H01F27/292 , H01S3/0092 , H01S3/10007 , H01S3/10084 , H01S3/1083 , H01S3/109 , H01S5/0071 , H01S5/0085 , H01S5/0604 , H01S5/4012
Abstract: A laser assembly for generating laser output light at an output wavelength of approximately 183 nm includes a fundamental laser, an optical parametric system (OPS), a fifth harmonic generator, and a frequency mixing module. The fundamental laser generates fundamental light at a fundamental frequency. The OPS generates a down-converted signal at a down-converted frequency. The fifth harmonic generator generates a fifth harmonic of the fundamental light. The frequency mixing module mixes the down-converted signal and the fifth harmonic to produce the laser output light at a frequency equal to a sum of the fifth harmonic frequency and the down-converted frequency. The OPS generates the down-converted signal by generating a down-converted seed signal at the down-converted frequency, and then mixing the down-converted seed signal with a portion of the fundamental light. At least one of the frequency mixing, frequency conversion or harmonic generation utilizes an annealed, deuterium-treated or hydrogen-treated CLBO crystal.
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公开(公告)号:US09748729B2
公开(公告)日:2017-08-29
申请号:US14872890
申请日:2015-10-01
Applicant: KLA-Tencor Corporation
Inventor: Yung-Ho Alex Chuang , J. Joseph Armstrong , Yujun Deng , Vladimir Dribinski , John Fielden , Jidong Zhang
IPC: G02F1/39 , H01S3/109 , G02B21/10 , G02B21/16 , G02B21/36 , H01S3/10 , H01S3/108 , H01S5/00 , H01S5/06 , H01S5/40 , G01N21/95 , G01N21/956
CPC classification number: H01F17/0006 , G01N21/9501 , G01N21/956 , G01N2021/95676 , G02B21/10 , G02B21/16 , G02B21/361 , G02F1/353 , G02F2001/3507 , G02F2001/354 , H01F17/04 , H01F27/292 , H01S3/0092 , H01S3/10007 , H01S3/10084 , H01S3/1083 , H01S3/109 , H01S5/0071 , H01S5/0085 , H01S5/0604 , H01S5/4012
Abstract: A laser assembly for generating laser output light at an output wavelength of approximately 183 nm includes a fundamental laser, an optical parametric system (OPS), a fifth harmonic generator, and a frequency mixing module. The fundamental laser generates fundamental light at a fundamental frequency. The OPS generates a down-converted signal at a down-converted frequency. The fifth harmonic generator generates a fifth harmonic of the fundamental light. The frequency mixing module mixes the down-converted signal and the fifth harmonic to produce the laser output light at a frequency equal to a sum of the fifth harmonic frequency and the down-converted frequency. The OPS generates the down-converted signal by generating a down-converted seed signal at the down-converted frequency, and then mixing the down-converted seed signal with a portion of the fundamental light. At least one of the frequency mixing, frequency conversion or harmonic generation utilizes an annealed, deuterium-treated or hydrogen-treated CLBO crystal.
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公开(公告)号:US20170229829A1
公开(公告)日:2017-08-10
申请号:US15495162
申请日:2017-04-24
Applicant: KLA-Tencor Corporation
Inventor: Yung-Ho Alex Chuang , J. Joseph Armstrong , Vladimir Dribinski , John Fielden
IPC: H01S3/00 , G02F1/37 , G02F1/39 , G01N21/956 , H01S3/23 , G02F1/355 , G01N21/88 , G02F1/35 , H01S3/16
Abstract: Laser and inspection systems that generate laser output light at sub-200 nm wavelengths using fundamental light at approximately 1064 nm. A second harmonic generator module generates second harmonic light directed to both an optical parametric (OP) module, which generates down-converted signal (idler light), and to a fifth harmonic generator module, which generates fifth harmonic light. The OP module includes an optical parametric oscillator that is configured to generate the idler signal at approximately 0.5 times the fundamental frequency. The idler light and fifth harmonic light are then mixed by a frequency mixing module to generate the laser output light having an output frequency equal to approximately 5.5 times the fundamental frequency.
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公开(公告)号:US09152008B1
公开(公告)日:2015-10-06
申请号:US14245020
申请日:2014-04-04
Applicant: KLA-Tencor Corporation
Inventor: J. Joseph Armstrong
CPC classification number: G02F1/3532 , G01N21/8806 , G01N21/9501 , G01N2201/06113 , G01N2201/068 , G02B3/06 , G02B5/3066 , G02B27/0025 , G02B27/141 , G02B27/28 , G02F1/37 , H01S3/0092 , H01S3/109
Abstract: The present invention includes a fundamental laser light source configured to generate fundamental wavelength laser light, a first nonlinear optical crystal configured to generate first alternate wavelength light, a second nonlinear optical crystal configured to generate second alternate wavelength light, a dual wavelength Brewster angle waveplate configured to rotate a polarization of the first alternate wavelength light relative to the second alternate wavelength light such that the first and second alternate wavelength light have the same polarization, a set of Brewster angle wavefront processing optics configured to condition the first and second alternate wavelengths of light, a harmonic separator configured to separate the first alternate wavelength light from the second alternate wavelength light, and a Brewster angle output window configured to transmit the first or second alternate wavelengths of light from the interior of a laser frequency conversion system to the exterior of the laser frequency conversion system.
Abstract translation: 本发明包括配置成产生基波长激光的基本激光光源,被配置为产生第一交替波长光的第一非线性光学晶体,被配置为产生第二交替波长光的第二非线性光学晶体,配置成双波长布鲁斯特角波片 使所述第一交替波长光相对于所述第二交替波长光的偏振旋转,使得所述第一和第二交替波长光具有相同的偏振;布鲁斯特角波前处理光学器件,被配置为调节所述第一和第二交替波长的光 ,配置成将第一交替波长光与第二交替波长光分离的谐波分离器和布鲁斯特角输出窗口,布鲁斯特角输出窗口被配置为将第一或第二交替波长的光从激光频率转换系统的内部传输到 激光变频系统。
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公开(公告)号:US20150139255A1
公开(公告)日:2015-05-21
申请号:US14607515
申请日:2015-01-28
Applicant: KLA-Tencor Corporation
Inventor: J. Joseph Armstrong
IPC: H01S3/067
CPC classification number: H01S3/06754 , G01N21/00 , G01N21/9501 , G01N21/956 , H01S3/0057 , H01S3/0092 , H01S3/02 , H01S3/06758 , H01S3/10 , H01S3/30 , H01S3/302 , H01S2301/08
Abstract: A laser system for semiconductor inspection includes a fiber-based fundamental light source for generating fundamental light that is then converted/mixed by a frequency conversion module to generate UV-DUV laser light. The fundamental light source includes a nonlinear chirp element (e.g., a Bragg grating or an electro-optic modulator) that adds a nonlinear chirp to the seed light laser system prior to amplification by the fiber amplifier(s) (e.g., doped fiber or Raman amplifiers). The nonlinear chirp includes an x2 or higher nonlinearity and is configured to compensates for the Self Phase Modulation (SPM) characteristics of the fiber-based amplifiers such that fundamental light is generated that has a spectral E95 bandwidth within five times that of the seed light. When multiple series-connected amplifiers are used, either a single nonlinear chirp element is provided before the amplifier string, or a chirp elements are included before each amplifier.
Abstract translation: 用于半导体检测的激光系统包括用于产生基本光的基于光纤的基本光源,然后由变频模块转换/混合以产生UV-DUV激光。 基本光源包括非线性啁啾元件(例如,布拉格光栅或电光调制器),其在由光纤放大器(例如,掺杂光纤或拉曼)放大之前将种子光激光系统添加非线性啁啾 放大器)。 非线性啁啾包括x2或更高的非线性,并且被配置为补偿基于光纤的放大器的自相位调制(SPM)特性,使得产生具有在种子光的5倍以内的光谱E95带宽的基本光。 当使用多个串联放大器时,在放大器串之前提供单个非线性啁啾元件,或者在每个放大器之前包括啁啾元件。
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公开(公告)号:US08964798B2
公开(公告)日:2015-02-24
申请号:US13939000
申请日:2013-07-10
Applicant: KLA-Tencor Corporation
Inventor: J. Joseph Armstrong
CPC classification number: H01S3/06754 , G01N21/00 , G01N21/9501 , G01N21/956 , H01S3/0057 , H01S3/0092 , H01S3/02 , H01S3/06758 , H01S3/10 , H01S3/30 , H01S3/302 , H01S2301/08
Abstract: A laser system for semiconductor inspection includes a fiber-based fundamental light source for generating fundamental light that is then converted/mixed by a frequency conversion module to generate UV-DUV laser light. The fundamental light source includes a nonlinear chirp element (e.g., a Bragg grating or an electro-optic modulator) that adds a nonlinear chirp to the seed light laser system prior to amplification by the fiber amplifier(s) (e.g., doped fiber or Raman amplifiers). The nonlinear chirp includes an x2 or higher nonlinearity and is configured to compensate for the Self Phase Modulation (SPM) characteristics of the fiber-based amplifiers such that fundamental light is generated that has a spectral E95 bandwidth within five times that of the seed light. When multiple series-connected amplifiers are used, either a single nonlinear chirp element is provided before the amplifier string, or chirp elements are included before each amplifier.
Abstract translation: 用于半导体检测的激光系统包括用于产生基本光的基于光纤的基本光源,然后由变频模块转换/混合以产生UV-DUV激光。 基本光源包括非线性啁啾元件(例如,布拉格光栅或电光调制器),其在由光纤放大器(例如,掺杂光纤或拉曼)放大之前将种子光激光系统添加非线性啁啾 放大器)。 非线性啁啾包括x2或更高的非线性,并且被配置为补偿基于光纤的放大器的自相位调制(SPM)特性,使得产生具有五倍于种子光的光谱E95带宽的基本光。 当使用多个串联放大器时,在放大器串之前提供单个非线性啁啾元件,或者在每个放大器之前包括啁啾元件。
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公开(公告)号:US10193293B2
公开(公告)日:2019-01-29
申请号:US15948141
申请日:2018-04-09
Applicant: KLA-Tencor Corporation
Inventor: Yung-Ho Chuang , J. Joseph Armstrong , Justin Dianhuan Liou , Vladimir Dribinski , David L. Brown
Abstract: A pulse multiplier includes a polarizing beam splitter, a wave plate, and a set of multi-surface reflecting components (e.g., one or more etalons and one or more mirrors). The polarizing beam splitter passes input laser pulses through the wave plate to the multi-surface reflecting components, which reflect portions of each input laser pulse back through the wave plate to the polarizing beam splitter. The polarizing beam splitter reflects each reflected portion to form an output of the pulse multiplier. The multi-surface reflecting components are configured such that the output pulses exiting the pulse multiplier have an output repetition pulse frequency rate that is at least double the input repetition pulse frequency.
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公开(公告)号:US20180191126A1
公开(公告)日:2018-07-05
申请号:US15901388
申请日:2018-02-21
Applicant: KLA-Tencor Corporation
Inventor: Yung-Ho Chuang , J. Joseph Armstrong , Yujun Deng , Justin Dianhuan Liou , Vladimir Dribinski , John Fielden
IPC: H01S3/30
CPC classification number: H01S3/302 , G01N21/9501 , G02B17/0892 , G02F1/353 , G02F1/395 , G02F2001/354 , H01S3/005 , H01S3/0092 , H01S3/067 , H01S3/06754 , H01S3/10053 , H01S3/11 , H01S3/16 , H01S3/1643 , H01S3/1666 , H01S3/23 , H01S3/2308
Abstract: An optical inspection system that utilizes sub-200 nm incident light beam to inspect a surface of an object for defects is described. The sub-200 nm incident light beam is generated by combining first light having a wavelength of about 1109 nm with second light having a wavelength of approximately 234 nm. An optical system includes optical components configured to direct the incident light beam to a surface of the object, and image relay optics are configured to collect and relay at least two channels of light to a sensor, where at least one channel includes light reflected from the object, and at least one channel includes light transmitted through the object. The sensor is configured to simultaneously detect both the reflected and transmitted light. A laser for generating the sub-200 nm incident light beam includes a fundamental laser, two or more harmonic generators, a frequency doubler and a two frequency mixing stages.
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