Invention Grant
- Patent Title: Parallel dipole line trap with variable gap and tunable trap potential
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Application No.: US15131566Application Date: 2016-04-18
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Publication No.: US09978493B2Publication Date: 2018-05-22
- Inventor: Oki Gunawan
- Applicant: International Business Machines Corporation
- Applicant Address: US NY Armonk
- Assignee: International Business Machines Corporation
- Current Assignee: International Business Machines Corporation
- Current Assignee Address: US NY Armonk
- Agency: Vazken Alexanian
- Agent Michael J. Chang, LLC
- Main IPC: H01F7/00
- IPC: H01F7/00 ; H01F7/02 ; H02N15/00

Abstract:
Techniques for tuning magnetic potential using a variable gap in a parallel dipole line (PDL) trap are provided. In one aspect, a PDL trap is provided. The PDL trap includes: a pair of dipole line magnets separated from one another by a variable gap g; and a diamagnetic object levitating above the dipole line magnets. The dipole line magnets can be separated from one another by at least one spacer, or a variable gap fixture can be used in which the dipole line magnets are affixed to separate mounts for varying the gap g between the dipole line magnets. A bigger trap or track can be built with multiple segments of PDL trap. A method of operating a PDL trap is also provided.
Public/Granted literature
- US20170301445A1 Parallel Dipole Line Trap with Variable Gap and Tunable Trap Potential Public/Granted day:2017-10-19
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