Invention Grant
- Patent Title: Method for the surface treatment of a semiconductor substrate
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Application No.: US15176876Application Date: 2016-06-08
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Publication No.: US09981471B2Publication Date: 2018-05-29
- Inventor: Fabrizio Porro
- Applicant: STMicroelectronics S.R.L.
- Applicant Address: IT Agrate Brianza
- Assignee: STMicroelectronics S.R.L.
- Current Assignee: STMicroelectronics S.R.L.
- Current Assignee Address: IT Agrate Brianza
- Agency: Seed IP Law Group LLP
- Priority: IT102015000088126 20151228
- Main IPC: H01L21/00
- IPC: H01L21/00 ; B41J2/14 ; B41J2/16

Abstract:
The present disclosure relates to a method for the application of an antiwetting coating on at least one surface of a substrate of semiconductor material comprising the steps of: a) applying on said at least one surface a metal layer of a material chosen in the group constituted by noble metals, coining metals, their oxides and their alloys; and b) applying on said metal layer a layer of a thiol of formula R—SH, where R is a linear alkyl chain having from 3 to 20 carbon atoms and, optionally, at least one hetero-atom, for obtaining an antiwetting coating. The disclosure further regards a method for the production of a nozzle plate for ink-jet printing and to an integrated ink-jet printhead provided with a nozzle plate obtained according to the method of the disclosure.
Public/Granted literature
- US20170182768A1 METHOD FOR THE SURFACE TREATMENT OF A SEMICONDUCTOR SUBSTRATE Public/Granted day:2017-06-29
Information query
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