- 专利标题: Electrowetting device
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申请号: US13609744申请日: 2012-09-11
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公开(公告)号: US09989752B2公开(公告)日: 2018-06-05
- 发明人: Kwang-Chul Jung , Seong Gyu Kwon , Mee Hye Jung
- 申请人: Kwang-Chul Jung , Seong Gyu Kwon , Mee Hye Jung
- 申请人地址: US WA Seattle
- 专利权人: Amazon Technologies, Inc.
- 当前专利权人: Amazon Technologies, Inc.
- 当前专利权人地址: US WA Seattle
- 代理机构: EIP US LLP
- 优先权: KR10-2012-0039776 20120417
- 主分类号: G02B26/00
- IPC分类号: G02B26/00 ; G02B3/12
摘要:
An electrowetting device is provided that includes a lower substrate and an upper substrate facing each other, a first electrode positioned on the lower substrate, an edge electrode positioned on the lower substrate and adjacent to an edge of the first electrode, a hydrophobic insulating layer positioned on the first electrode and the edge electrode, a partition positioned on the lower substrate, a second electrode positioned on the upper substrate, and a first liquid and a second liquid positioned between the upper substrate and the lower substrate, wherein an electric field of a portion where the edge electrode is positioned is smaller than an electric field of a portion where the first electrode is positioned.
公开/授权文献
- US20130271817A1 ELECTROWETTING DEVICE 公开/授权日:2013-10-17
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