Invention Grant
- Patent Title: Semiconductor device having a barrier layer made of amorphous molybdenum nitride and method for producing such a semiconductor device
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Application No.: US15427428Application Date: 2017-02-08
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Publication No.: US09997459B2Publication Date: 2018-06-12
- Inventor: Jochen Hilsenbeck , Jens Peter Konrath , Stefan Krivec
- Applicant: Infineon Technologies AG
- Applicant Address: DE Neubiberg
- Assignee: Infineon Technologies AG
- Current Assignee: Infineon Technologies AG
- Current Assignee Address: DE Neubiberg
- Agency: Murphy, Bilak & Homiller, PLLC
- Main IPC: H01L21/768
- IPC: H01L21/768 ; H01L23/532 ; H01L21/285 ; H01L29/20 ; H01L29/16

Abstract:
A semiconductor device includes a semiconductor body having a front face, a back face and an active zone at the front face. A front surface metallization layer having a front face and a back face is disposed over the semiconductor body so that the back face of the front surface metallization layer faces the front face of the semiconductor body and is electrically connected to the active zone. An upper barrier layer made of amorphous molybdenum nitride is disposed on the front face of the front surface metallization layer.
Public/Granted literature
- US20170243828A1 Semiconductor Device and Method for Producing a Semiconductor Device Public/Granted day:2017-08-24
Information query
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