Invention Grant
- Patent Title: Transistor device with segmented contact layer
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Application No.: US15404285Application Date: 2017-01-12
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Publication No.: US09997608B2Publication Date: 2018-06-12
- Inventor: Karoline Koepp , Herbert Gietler
- Applicant: Infineon Technologies AG
- Applicant Address: DE Neubiberg
- Assignee: Infineon Technologies AG
- Current Assignee: Infineon Technologies AG
- Current Assignee Address: DE Neubiberg
- Agency: Murphy, Bilak & Homiller, PLLC
- Priority: DE102016100504 20160113
- Main IPC: H01L29/423
- IPC: H01L29/423 ; H01L29/40 ; H01L29/417 ; H01L29/78 ; H01L29/06

Abstract:
Disclosed is a transistor device. The transistor device includes a plurality of device cells each having an active device region integrated in a semiconductor body and electrically connected to a contact layer. The contact layer includes a plurality of layer sections separated from each other by a separation layer. A resistivity of the separation layer is at least 100 times the resistivity of the layer sections.
Public/Granted literature
- US20170200795A1 Transistor Device with Segmented Contact Layer Public/Granted day:2017-07-13
Information query
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