Invention Grant
- Patent Title: Methods to utilize piezoelectric materials as gate dielectric in high frequency RBTs in an IC device
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Application No.: US15458316Application Date: 2017-03-14
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Publication No.: US09997695B2Publication Date: 2018-06-12
- Inventor: Zoran Krivokapic , Bichoy Bahr
- Applicant: GLOBALFOUNDRIES Inc.
- Applicant Address: KY Grand Cayman
- Assignee: GLOBALFOUNDRIES INC.
- Current Assignee: GLOBALFOUNDRIES INC.
- Current Assignee Address: KY Grand Cayman
- Agency: Ditthavong & Steiner, P.C.
- Main IPC: H01L29/84
- IPC: H01L29/84 ; H01L41/107 ; H01L41/047 ; H01L41/29 ; H01L29/78

Abstract:
Methods to utilize piezoelectric materials as a gate dielectric in RBTs in an IC device to generate and sense higher frequency signals with high Qs and resulting devices are disclosed. Embodiments include forming, on an upper surface of a semiconductor layer, RBTs comprising even multiples of sensing RBTs and driving RBTs, each RBT including a piezoelectric gate dielectric layer, a gate, and a dielectric spacer on opposite sides of the piezoelectric gate dielectric layer and gate, wherein at least one pair of sensing RBTs is directly between two groups of driving RBTs; forming metal layers, separated by interlayer dielectric layers, above the RBTs; and forming vias through a dielectric layer above the RBTs connecting the RBTs to a metal layer.
Public/Granted literature
- US20170222126A1 METHODS TO UTILIZE PIEZOELECTRIC MATERIALS AS GATE DIELECTRIC IN HIGH FREQUENCY RBTs IN AN IC DEVICE Public/Granted day:2017-08-03
Information query
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