A wafer carrier including thirty-five pockets arranged on a top surface, configured to be used with a chemical vapor deposition device, is provided. The wafer carrier comprises: a body having a top surface and a bottom surface arranged opposite one another, and a plurality of pockets defined in the top surface of the wafer carrier, wherein the plurality of pockets consist of a total of thirty-five pockets, each of the pockets is arranged along one of three circles, and the three circles are concentric with one another and with a circular outline formed by a perimeter of the top surface.