再颁专利
USRE33424E Apparatus and method for measuring the depth of fine engraved patterns
失效
用于测量精细雕刻图案深度的装置和方法
- 专利标题: Apparatus and method for measuring the depth of fine engraved patterns
- 专利标题(中): 用于测量精细雕刻图案深度的装置和方法
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申请号: US254964申请日: 1988-10-07
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公开(公告)号: USRE33424E公开(公告)日: 1990-11-06
- 发明人: Minori Noguchi , Toru Otsubo , Susumu Aiuchi
- 申请人: Minori Noguchi , Toru Otsubo , Susumu Aiuchi
- 申请人地址: JPX Tokyo
- 专利权人: Hitachi, Ltd.
- 当前专利权人: Hitachi, Ltd.
- 当前专利权人地址: JPX Tokyo
- 主分类号: G01B11/22
- IPC分类号: G01B11/22
摘要:
An apparatus .Iadd.and method .Iaddend.for measuring in a non-contact manner the depth of pits and grooves formed by etching in periodic patterns on the surface of a substrate. The measurement is based on the detection of the intensity of a diffraction ray excluding that of the 0th order through the irradiation of a light beam with variable wave length to the sample. Whereas, the conventional measuring system is sensitive to a diffraction ray of the 0th order, i.e., the major component of the reflected light, that hampers the detection of a higher order diffraction ray carrying information of the depth.
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