再颁专利
USRE42980E1 Method for applying a resist layer, uses of adhesive materials, and adhesive materials and resist layer
有权
涂布抗蚀剂层的方法,粘合剂材料的用途以及粘合剂材料和抗蚀剂层
- 专利标题: Method for applying a resist layer, uses of adhesive materials, and adhesive materials and resist layer
- 专利标题(中): 涂布抗蚀剂层的方法,粘合剂材料的用途以及粘合剂材料和抗蚀剂层
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申请号: US12798150申请日: 2010-03-29
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公开(公告)号: USRE42980E1公开(公告)日: 2011-11-29
- 发明人: Werner Kröninger , Manfred Schneegans
- 申请人: Werner Kröninger , Manfred Schneegans
- 申请人地址: DE Neubiberg
- 专利权人: Infineon Technologies AG
- 当前专利权人: Infineon Technologies AG
- 当前专利权人地址: DE Neubiberg
- 优先权: DE10260235 20021220
- 主分类号: G03C11/12
- IPC分类号: G03C11/12 ; G03F7/34 ; G03F7/42 ; G03F7/16
摘要:
A method in which a resist layer is applied to a base layer is disclosed. The resist layer includes an adhesive material, and the adhesive force of the adhesive material decreases or increases during an irradiation process. Residues of the resist layer may be stripped using the disclosed method.