Invention Application
WO1986005169A1 RHOMBOHEDRAL POLYCRYSTALLINE BORON NITRIDE AND PROCESS FOR ITS PRODUCTION
审中-公开
RHOMBOHEDRAL POLYCRYSTALLINE BORON NITRIDE及其生产工艺
- Patent Title: RHOMBOHEDRAL POLYCRYSTALLINE BORON NITRIDE AND PROCESS FOR ITS PRODUCTION
- Patent Title (中): RHOMBOHEDRAL POLYCRYSTALLINE BORON NITRIDE及其生产工艺
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Application No.: PCT/JP1986000095Application Date: 1986-02-27
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Publication No.: WO1986005169A1Publication Date: 1986-09-12
- Inventor: RESEARCH DEVELOPMENT CORPORATION OF JAPAN
- Applicant: RESEARCH DEVELOPMENT CORPORATION OF JAPAN , MATSUDA, Toshitsugu , NAKAE, Hiroyuki , HIRAI, Toshio
- Assignee: RESEARCH DEVELOPMENT CORPORATION OF JAPAN,MATSUDA, Toshitsugu,NAKAE, Hiroyuki,HIRAI, Toshio
- Current Assignee: RESEARCH DEVELOPMENT CORPORATION OF JAPAN,MATSUDA, Toshitsugu,NAKAE, Hiroyuki,HIRAI, Toshio
- Priority: JP60/041019 19850304
- Main IPC: C01B21/064
- IPC: C01B21/064
Abstract:
Highly pure, high-density rhombohedral polycrystalline boron nitride substantially comprising rhombohedral crystals and having a three-fold axis of symmetry (an axis parallel to axis c according to hexagonal representation) oriented to one direction, which can be obtained in an arbitrary mass or thin film form by a chemical vapor deposition process of introducing a boron source gas and a nitrogen source gas and, optionally, a diluting and carrier gas into a reactor provided with a heated base to deposit boron nitride on the base, while providing a nitrogen source gas- and/or a carrier gas-diffusing layer around the heated base. The resulting boron nitride is extremely useful as semiconductors, crucibles for melting, various high-temperature jigs, high-frequency insulators, microwave transmitting apertures, and boron source for semi-conductors and, in addition, optimal as a precursor of high-pressure phase cubic boron nitride.
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