Invention Application
- Patent Title: ROTATING SURFACE OF REVOLUTION REACTOR WITH SHEARING MECHANISMS
- Patent Title (中): 具有剪切机理的旋转反应器的旋转表面
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Application No.: PCT/GB0000523Application Date: 2000-02-17
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Publication No.: WO0048730A3Publication Date: 2000-11-30
- Inventor: RAMSHAW COLIN , JACHUCK ROSHAN JEET JEE
- Applicant: UNIV NEWCASTLE , RAMSHAW COLIN , JACHUCK ROSHAN JEET JEE
- Assignee: UNIV NEWCASTLE,RAMSHAW COLIN,JACHUCK ROSHAN JEET JEE
- Current Assignee: UNIV NEWCASTLE,RAMSHAW COLIN,JACHUCK ROSHAN JEET JEE
- Priority: GB9903474 1999-02-17
- Main IPC: B01D9/02
- IPC: B01D9/02 ; B01F5/00 ; B01F5/22 ; B01F13/10 ; B01J4/00 ; B01J10/02 ; B01J19/00 ; B01J19/08 ; B01J19/10 ; B01J19/12 ; B01J19/18 ; B01J35/02 ; B01J35/04 ; C08F2/01 ; C08F10/02 ; C08G63/78
Abstract:
A reactor including a rotatable disc (3) having a surface (5) onto which reactant (15) is supplied by way of a feed (4). The disc (3) is rotated at high speed, and the reactant (15) spills over the surface (5) so as to form a film (17). A shear member (18, 20) is mounted close to the surface (5) so as to contact the film (17) during operation of the reactor, thereby applying a shearing force to the reactant (15) so as to aid mixing.
Information query
