Invention Application
- Patent Title: MULTI-CONNECTION VIA
- Patent Title (中): 多连接通过
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Application No.: PCT/US0015551Application Date: 2000-06-05
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Publication No.: WO0078105A9Publication Date: 2002-06-13
- Inventor: KIANI SEPEHR , KHUSID MIKHAIL
- Applicant: TERADYNE INC
- Assignee: TERADYNE INC
- Current Assignee: TERADYNE INC
- Priority: US13873099 1999-06-11; US13906399 1999-06-11; US14332099 1999-07-12; US36000299 1999-07-23
- Main IPC: H05K1/02
- IPC: H05K1/02 ; H05K1/11 ; H05K3/04 ; H05K3/30 ; H05K3/34 ; H05K3/40 ; H05K3/42
Abstract:
An interconnection circuit and related techniques are described. The interconnection circuit (10) includes a plated through hole (26) having a plurality of electrically isolated segments (26a, 26b) with at least one of the plurality of electrically isolated segments (26a) coupled to a signal path (27a, 27b) and at least one of the electrically isolated segments (26b) coupled to the ground (12). With this arrangement, the circuit provides a signal path between a first and a second different layers of a multilayer. By providing one segment (26a) as a signal segment and another segment (26b) as a ground segment the size and shape of the electrically isolated segments (26a, 26b) can be selected to provide the interconnection circuit having a predetermined impedance characteristic. The interconnection circuit can thus be impedance matched to circuit board circuits, devices and transmission lines, such as striplines, microstrips and co-planar waveguides. This results in an interconnection circuit which maintains the integrity of relatively high-frequency signals propagating through the interconnection circuit from the first layer to the second layer. The interconnect circuits can be formed by creating distinct conductor paths (26a, 26b) within the cylindrical plated through-holes (26) using variety of manufacturing techniques including, but not limited to, broaching techniques, electrostatic discharge milling (EDM) techniques and laser etching techniques.
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