Invention Application
- Patent Title: PERFLUOROALKYLSULFONIC ACID COMPOUNDS FOR PHOTORESISTS
- Patent Title (中): 用于光化剂的全氟烷基磺酸化合物
-
Application No.: PCT/US0210800Application Date: 2002-04-05
-
Publication No.: WO02082185B1Publication Date: 2002-12-27
- Inventor: FERREIRA LAWRENCE , BLAKENEY ANDREW J , SPAZIANO GREGORY DOMINIC , DIMOV OGNIAN , KOCAB THOMAS J , HATFIELD JOHN P
- Applicant: ARCH SPEC CHEM INC
- Assignee: ARCH SPEC CHEM INC
- Current Assignee: ARCH SPEC CHEM INC
- Priority: US28165201 2001-04-05
- Main IPC: C07C309/10
- IPC: C07C309/10 ; C07C321/28 ; C07C323/20 ; C07C381/12 ; C07D207/40 ; C07D209/94 ; C07D333/46 ; G03F7/004 ; G03F7/039 ; C07C303/00 ; C07C309/01 ; C07C309/02 ; C07C309/06 ; C07C309/63
Abstract:
A photoacid compound having general structure: R-O(CF2)nSO3X wherein n is an integer between about 1 to 4; R is selected from the group consisting of: substituted or unsubstituted C1-C12 linear or branched alkyl or alkenyl, substituted or unsubstituted araalkyl, substituted or unsubstituted aryl, substituted or unsubstituted bicycloalkyl, substituted or unsubstituted tricycloalkyl, hydrogen, alkyl sulfonic acid, substituted or unsubstituted perfluoroalkyl, the general structure F((CF2)pO)m(CF2)q- wherein p is between about 1 to 4, m is between about 0 to 3 and q is between about 1 to 4, and substituted or unsubstituted partially fluorinated alkyl, halofluoroalkyl, perfluoroalkylsulfonic, or glycidyl; and X is selected from the group consisting of: organic cations and covalently bonded organic radicals.
Information query