Invention Application
WO2004015496A3 USING SCANNING PROBE MICROSCOPE TOPOGRAPHIC DATA TO REPAIR PHOTOMASK DEFECT USING CHARGED PARTICLE BEAMS
审中-公开
使用扫描探针显微镜的地形数据修复使用充电颗粒的光斑缺陷
- Patent Title: USING SCANNING PROBE MICROSCOPE TOPOGRAPHIC DATA TO REPAIR PHOTOMASK DEFECT USING CHARGED PARTICLE BEAMS
- Patent Title (中): 使用扫描探针显微镜的地形数据修复使用充电颗粒的光斑缺陷
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Application No.: PCT/US0325801Application Date: 2003-08-08
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Publication No.: WO2004015496A3Publication Date: 2005-04-07
- Inventor: FERRANTI DAVID C , RAY VALERY , SMITH GERALD , MUSIL CHRISTIAN R
- Applicant: FEI CO , FERRANTI DAVID C , RAY VALERY , SMITH GERALD , MUSIL CHRISTIAN R
- Assignee: FEI CO,FERRANTI DAVID C,RAY VALERY,SMITH GERALD,MUSIL CHRISTIAN R
- Current Assignee: FEI CO,FERRANTI DAVID C,RAY VALERY,SMITH GERALD,MUSIL CHRISTIAN R
- Priority: US40201002 2002-08-08; US63630903 2003-08-07
- Main IPC: B05D3/06
- IPC: B05D3/06 ; C23C14/22 ; C23C14/28 ; C23C14/58 ; G03F20060101 ; G03F1/74 ; H01L21/027 ; B32B35/00
Abstract:
Topographical data from a scanning probe microscope (5Pm) or similar device is used as a substitute for endpoint detection to allow accurate repair of defects in phase shift photomasks using a charged particle beam system (210-216). The topographical data from a defect area is used to create a display of a semitransparent topographical map (217), which can be superimposed over a charged particle beam image (218-222). The density of the topographical image and the alignment of the two images can be adjusted by the operator in order to accurately position the beam (224). Topographical data from an SPM can also be used to adjust charged particle beam dose for each point within the defect area based upon the elevation and surface angle at the particular point (225-230). The charge particle beam is then used to repair the defect (s) (232-234).
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