公开(公告)号：WO2023287550A1

公开(公告)日：2023-01-19

申请号：PCT/US2022/034095

申请日：2022-06-17

申请人： APPLIED MATERIALS, INC.

发明人： CHE, Xiaozhou ,  SCOTT, Graeme Jamieson ,  HAGBORG, Richard Gustav ,  OUYE, Alan H. ,  YEE, Nelson A.

IPC分类号： C23C14/54 ,  C23C14/12 ,  C23C14/22 ,  C23C16/52 ,  C23C16/455 ,  G01B7/06

摘要： One or more embodiments described herein generally relate to methods and systems for monitoring film thickness using a sensor assembly. In embodiments described herein, a process chamber having a chamber body, a substrate support disposed in the chamber body, a lid disposed over the chamber body, and a sensor assembly coupled to the chamber body at a lower portion of the sensor assembly. The sensor assembly is coupled to the lid at an upper portion of the sensor assembly. The sensor assembly includes one or more apertures disposed through one or more sides of the sensor assembly, and the one or more sensors are disposed in the sensor assembly through the one or more of the apertures.

公开(公告)号：WO2023282988A1

公开(公告)日：2023-01-12

申请号：PCT/US2022/031096

申请日：2022-05-26

申请人： APPLIED MATERIALS, INC.

发明人： ISHIKAWA, David Masayuki ,  ACHARYA, Sumedh Dattatraya ,  SIVARAMAKRISHNAN, Visweswaren

IPC分类号： C23C14/56 ,  C23C14/22 ,  C23C14/24

摘要： An evaporation system for providing a gas for a reactive deposition process, reactive deposition apparatuses, and methods of reactive deposition are provided. The evaporation system in includes a multi-zone diffuser assembly for single or double-sided continuous roll-to-roll or batch coating of web substrates. The diffuser assembly is sized to accommodate at least a portion of a coating drum. The diffuser assembly includes a plurality of interchangeable solid plates and diffuser plates for delivering an evaporated material toward a web substrate. The diffuser plates are fluidly coupled with an evaporation source.

公开(公告)号：WO2023278388A1

公开(公告)日：2023-01-05

申请号：PCT/US2022/035236

申请日：2022-06-28

申请人： APPLIED MATERIALS, INC.

发明人： RAMALINGAM, Jothilingam ,  CAO, Yong ,  LAVITSKY, Ilya ,  MILLER, Keith A. ,  GUNG, Tza-Jing ,  TANG, Xianmin ,  LAVAN, Shane ,  SCHMIEDING, Randy D. ,  FORSTER, John C. ,  SAVANDAIAH, Kirankumar Neelasandra

IPC分类号： C23C14/56 ,  C23C14/34 ,  C23C14/50 ,  C23C14/22 ,  H01J37/34 ,  H01J37/32 ,  C23C14/54 ,  C23C14/564 ,  H01J37/32091 ,  H01J37/32357 ,  H01J37/3435 ,  H01J37/3441 ,  H01J37/3447 ,  H01J37/3488

摘要： A physical vapor deposition processing chamber is described. The processing chamber includes a target backing plate in a top portion of the processing chamber, a substrate support in a bottom portion of the processing chamber, a deposition ring positioned at an outer periphery of the substrate support and a shield. The substrate support has a support surface spaced a distance from the target backing plate to form a process cavity. The shield forms an outer bound of the process cavity. In-chamber cleaning methods are also described. In an embodiment, the method includes closing a bottom gas flow path of a processing chamber to a process cavity, flowing an inert gas from the bottom gas flow path, flowing a reactant into the process cavity through an opening in the shield, and evacuating the reaction gas from the process cavity.

公开(公告)号：WO2022261684A1

公开(公告)日：2022-12-22

申请号：PCT/AT2022/060188

申请日：2022-06-08

申请人： PLASMATERIA GMBH

发明人： JAROŠ, Martin ,  KOHLHAUSER, Bernhard

IPC分类号： C23C14/04 ,  H01J37/32 ,  C23C14/22 ,  C23C14/24 ,  C23C14/32

摘要： The invention relates to an apparatus for forming a coating on and/or modifying the properties of the inner surface of a hollow article (1 ), wherein the apparatus comprises a plasma source (2), the plasma source (2) having an elongate shape and comprising a cathode (3) as well as a target (4), wherein the target (4) is a thermionic electron emission source, wherein the target (4) is connected to the cathode (3) in an electrically conductive manner, wherein the plasma source (2) further comprises a masking (5) which partially covers the outer surface of the cathode (3) and the target (4), and which masking (5) is adapted to prevent the formation of plasma on an area covered by the masking (5) during operation of the apparatus, wherein a plasma formation area (6) is provided on the target (4), which plasma formation area (6) is not covered by the masking (5). The invention further relates to a target (4), an arrangement of the apparatus, a method, as well as a hollow article (1).

公开(公告)号：WO2022235421A1

公开(公告)日：2022-11-10

申请号：PCT/US2022/025193

申请日：2022-04-18

申请人： APPLIED MATERIALS, INC.

发明人： SAUER, Andreas ,  HLADIK, Annemarie ,  KÖHLER, Bernhard ,  DEPPISCH, Thomas ,  ARMSTRONG, Claire ,  BUSCHBECK, Wolfgang

IPC分类号： C23C14/56 ,  C23C14/54 ,  C23C14/22 ,  C23C16/54 ,  C23C16/46 ,  C23C16/455

摘要： A roller (100) for transporting a flexible substrate (10) is described. The roller (100) includes a main body (101) having a plurality of gas supply slits (103) provided in an outer surface of the main body (101). The plurality of gas supply slits (103) extends in a direction of a central rotation axis (111) of the roller (100). Further, the roller (100) includes a sleeve (104) provided circumferentially around and in contact with the main body (101). The sleeve (104) has a plurality of gas outlets (105) extending in a radial direction (R) and being provided above the plurality of gas supply slits (103).

公开(公告)号：WO2022214376A1

公开(公告)日：2022-10-13

申请号：PCT/EP2022/058426

申请日：2022-03-30

申请人： CARL ZEISS SMT GMBH

发明人： LANGE, Felix ,  PAZIDIS, Alexandra ,  HÄRTLING, Marcel ,  WIEGAND, Alexander

IPC分类号： C23C16/48 ,  C23C16/30 ,  C30B29/12 ,  C23C14/06 ,  C23C14/28 ,  C23C14/22 ,  G02B13/14 ,  G03F7/20 ,  C23C14/00

摘要： Die Erfindung betrifft ein Verfahren zum Abscheiden mindestens einer Schicht (2) aus einem ionisch gebundenen Festkörper auf einem Substrat (3), umfassend die Schritte: Überführen eines Beschichtungsmaterials (8) in die Gasphase, sowie Abscheiden des in die Gasphase überführten Beschichtungsmaterials (8) auf dem Substrat (3). Die Schicht (2) wird während des Abscheidens mit UV/VIS-Licht (11a, 11b) bestrahlt. Die Erfindung betrifft auch eine Vorrichtung (1) zur Abscheidung mindestens einer Schicht (2) aus einem ionisch gebundenen Festkörper, umfassend: eine Beschichtungskammer (4) mit einer Halterung (5) für ein Substrat (3), sowie mindestens eine Beschichtungsquelle (7), die ausgebildet ist, ein Beschichtungsmaterial (8) in die Gasphase zu überführen und innerhalb der Beschichtungskammer (4) als Schicht (2) auf dem Substrat (3) abzuscheiden. Die Vorrichtung (1) umfasst eine oder mehrere UV/VIS-Lichtquellen (12a, 12b) zur Bestrahlung der Schicht (2) mit UV/VIS-Licht (11a, 11b) während des Abscheidens. Die Erfindung betrifft auch ein optisches Element mit einem Substrat (3), das mit mindestens einer solchen Schicht (2) beschichtet ist, sowie eine optische Anordnung mit mindestens einem solchen optischen Element.

公开(公告)号：WO2022202729A1

公开(公告)日：2022-09-29

申请号：PCT/JP2022/012943

申请日：2022-03-22

申请人： 株式会社ＭＯＬＤＩＮＯ

发明人： 那須　宣仁 ,  佐々木　智也

IPC分类号： B23B27/14 ,  C23C14/06 ,  C23C14/22

摘要： 被覆切削工具は、基材と硬質皮膜とを備える。硬質皮膜は、基材の上に配置されるｂ層と、ｂ層の上に配置される積層皮膜であって、ＡｌとＣｒを含有する窒化物または炭窒化物のｃ１層と、ＴｉとＳｉを含有する窒化物または炭窒化物のｃ２層と、がそれぞれ５０ｎｍ以下の膜厚で交互に積層した積層皮膜であるｃ層と、ｃ層の上に配置されるＴｉＳｉの窒化物または炭窒化物であるｄ層と、を有する。ｃ層は、金属（半金属を含む）元素と非金属元素の総量に対して、Ａｒを０．１０原子％以下で含有している。金属（半金属を含む）元素、窒素、酸素、炭素およびＡｒの合計を１００原子％とした場合の硬質皮膜の窒素の原子比率Ａと金属（半金属を含む）元素の原子比率Ｂとが１．０２＜Ａ／Ｂの関係を満たす。

公开(公告)号：WO2022200507A1

公开(公告)日：2022-09-29

申请号：PCT/EP2022/057786

申请日：2022-03-24

申请人： OERLIKON SURFACE SOLUTIONS AG, PFÄFFIKON

发明人： YALAMANCHILI, Siva Phani Kumar

IPC分类号： H01M4/04 ,  C23C14/16 ,  C23C14/22 ,  C23C14/32 ,  C23C14/34 ,  C23C14/58 ,  C23C16/06 ,  H01M4/38 ,  C23C14/02 ,  H01M4/02

摘要： The present invention relates to a battery half-cell comprising a copper foil, a lithium anode layer deposited on a surface of the copper foil and a capping layer, preferably a conformal capping layer, deposited on the lithium anode layer. The lithium anode layer comprises vertical structures such as columnar structures and/or grid structures.

公开(公告)号：WO2022191370A1

公开(公告)日：2022-09-15

申请号：PCT/KR2021/012078

申请日：2021-09-07

申请人： 한국산업기술대학교산학협력단

发明人： 이희철 ,  박세용 ,  노순호

IPC分类号： C23C14/00 ,  C23C14/08 ,  C23C14/58 ,  C23C14/34 ,  C23C14/35 ,  C23C14/56 ,  C23C14/22

摘要： 본 발명은 사전 산화된 다공성 금속 박막의 제조 장치, 다공성 금속산화물 박막의 제조 방법 및 이에 의해 제조된 다공성 금속산화물 박막에 관한 것으로, 본 발명의 일 실시예에 따른 사전 산화된 다공성 금속 박막의 제조 장치는, 제1 영역을 포함하는 상부 챔버; 제2 영역을 포함하는 하부 챔버; 상기 상부 챔버 및 상기 하부 챔버 사이의 연결 지점에 위치하고, 타겟으로부터 빠져나온 금속 입자들을 통과시키는 적어도 하나의 홀을 가지는 금속판; 상기 제2 영역에서 기판을 지지하는 지그; 및 상기 금속판 및 상기 지그 사이에 형성된 산소 가스링;을 포함한다.

公开(公告)号：WO2022179742A1

公开(公告)日：2022-09-01

申请号：PCT/EP2021/087157

申请日：2021-12-21

申请人： AMS-OSRAM AG

发明人： HERMANN, Paul ,  EILMSTEINER, Gerhard ,  BRANDNER, Hannes

IPC分类号： C23C14/04 ,  C23C14/14 ,  C23C14/22 ,  C23C14/34 ,  G02B5/20

摘要： A method of manufacturing an optical element (705), such as a metal-dielectric filter, is disclosed. The method comprises a step of deposition of a layer of metallic material (170). The method comprises a step of deposition of an encapsulating layer of dielectric material (190), such that the layer of metallic material (170) is encapsulated between the encapsulating layer of dielectric material (190) and the substrate (110) or a preceding layer of dielectric material (105). Deposition of the encapsulating layer of dielectric material (190) is more isotropic than deposition of the layer of metallic material (170). Also disclosed is an optical element (705) manufactured according to the method.