Invention Application
WO2004097890A2 OBJECTIVE LENS ARRANGEMENT FOR USE IN A CHARGED PARTICLE BEAM COLUMN
审中-公开
用于带电粒子束柱的目标透镜布置
- Patent Title: OBJECTIVE LENS ARRANGEMENT FOR USE IN A CHARGED PARTICLE BEAM COLUMN
- Patent Title (中): 用于带电粒子束柱的目标透镜布置
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Application No.: PCT/US2004/012468Application Date: 2004-04-22
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Publication No.: WO2004097890A2Publication Date: 2004-11-11
- Inventor: PETROV, Igor
- Applicant: APPLIED MATERIALS ISRAEL, LTD. , APPLIED MATERIALS, INC. , PETROV, Igor
- Applicant Address: 8 Oppenheimer Street, 76236 Rehovot IL
- Assignee: APPLIED MATERIALS ISRAEL, LTD.,APPLIED MATERIALS, INC.,PETROV, Igor
- Current Assignee: APPLIED MATERIALS ISRAEL, LTD.,APPLIED MATERIALS, INC.,PETROV, Igor
- Current Assignee Address: 8 Oppenheimer Street, 76236 Rehovot IL
- Agency: FAHMI, Tarek
- Priority: US10/423,289 20030425
- Main IPC: H01J37/00
- IPC: H01J37/00
Abstract:
An objective lens arrangement is presented for mounting in a charged particle beam column adjacent to an anode tube that defines a beam drift space for a charged particle beam propagating towards a sample. The lens arrangement comprises a magnetic lens and an electrostatic lens, wherein the eletrostatic lens includes upper and lower electrodes arranged in a spaced-apart coaxial relationship along an optical axis of the lens arrangement.
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