Invention Application
- Patent Title: EVACUATION APPARATUS
- Patent Title (中): 抽水设备
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Application No.: PCT/JP2004015563Application Date: 2004-10-14
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Publication No.: WO2005038255A3Publication Date: 2005-11-03
- Inventor: KAWAMURA TAKESHI , KAGAWA KOICHI
- Applicant: EBARA CORP , KAWAMURA TAKESHI , KAGAWA KOICHI
- Assignee: EBARA CORP,KAWAMURA TAKESHI,KAGAWA KOICHI
- Current Assignee: EBARA CORP,KAWAMURA TAKESHI,KAGAWA KOICHI
- Priority: JP2003358424 2003-10-17
- Main IPC: C23C16/44
- IPC: C23C16/44 ; F04B49/06 ; F04C18/00 ; F04C18/12 ; F04C18/16 ; F04C21/00 ; F04C23/00 ; F04C25/02 ; F04C28/02 ; F04C28/08 ; F04C29/00
Abstract:
The present invention relates to an evacuation apparatus for evacuating a vacuum chamber of a substrate processing apparatus for processing a substrate such as a semiconductor wafer or liquid crystal panel. An evacuation apparatus according to the present invention includes a first vacuum pump connected to a vacuum chamber, and a second vacuum pump connected to the first vacuum pump. The first vacuum pump has a pair of multistage pump rotors.
Public/Granted literature
- WO2005038255B1 EVACUATION APPARATUS Public/Granted day:2005-12-29
Information query
IPC分类:
