Invention Application
- Patent Title: COATING COMPOSITION OPTIMIZATION FOR VIA FILL AND PHOTOLITHOGRAPHY APPLICATIONS AND METHODS OF PREPARATION THEREOF
- Patent Title (中): 涂料组合物通过薄膜和光刻胶应用的优化及其制备方法
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Application No.: PCT/US2004/025231Application Date: 2004-08-04
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Publication No.: WO2005041255A2Publication Date: 2005-05-06
- Inventor: KENNEDY, Joseph , STUCK, Jason
- Applicant: HONEYWELL INTERNATIONAL, INC. , KENNEDY, Joseph , STUCK, Jason
- Applicant Address: P.O. Box 2245, 101 Columbia Road, Morristown, NJ 07962 US
- Assignee: HONEYWELL INTERNATIONAL, INC.,KENNEDY, Joseph,STUCK, Jason
- Current Assignee: HONEYWELL INTERNATIONAL, INC.,KENNEDY, Joseph,STUCK, Jason
- Current Assignee Address: P.O. Box 2245, 101 Columbia Road, Morristown, NJ 07962 US
- Agency: THOMPSON, Sandra, P.
- Priority: US60/492,606 20030804
- Main IPC: H01L
- IPC: H01L
Abstract:
A sacrificial coating material includes: at least one inorganic compound, and at least one material modification agent, wherein the sacrificial coating material is dissolvable in an alkaline-based chemistry or a fluorine-based chemistry. A method of producing a sacrificial coating material includes: providing at least one inorganic compound, providing at least one material modification agent, combining the at least one inorganic compound with the at least one material modification agent to form the sacrificial coating material, wherein the sacrificial coating material is dissolvable in an alkaline-based chemistry or a fluorine-based chemistry, but not organic casting solvents commonly used in organic BARC materials.
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