Invention Application
- Patent Title: SEMICONDUCTOR CIRCUIT ARRANGEMENT AND METHOD FOR THE PRODUCTION THEREOF
- Patent Title (中): 半导体电路装置及其生产方法
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Application No.: PCT/EP2005053779Application Date: 2005-08-03
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Publication No.: WO2006021483A3Publication Date: 2006-10-05
- Inventor: HALIK MARCUS , DEHM CHRISTINE , KLAUK HAGEN , ZSCHIESCHANG UTE , SCHMID GUENTER
- Applicant: INFINEON TECHNOLOGIES AG , HALIK MARCUS , DEHM CHRISTINE , KLAUK HAGEN , ZSCHIESCHANG UTE , SCHMID GUENTER
- Assignee: INFINEON TECHNOLOGIES AG,HALIK MARCUS,DEHM CHRISTINE,KLAUK HAGEN,ZSCHIESCHANG UTE,SCHMID GUENTER
- Current Assignee: INFINEON TECHNOLOGIES AG,HALIK MARCUS,DEHM CHRISTINE,KLAUK HAGEN,ZSCHIESCHANG UTE,SCHMID GUENTER
- Priority: DE102004040505 2004-08-20
- Main IPC: H01L51/10
- IPC: H01L51/10 ; H01L27/28
Abstract:
The invention relates to a semiconductor circuit arrangement (10) and to a method for the production thereof, in which a protective material region (50) made of poly(para-xylene) is formed for the material separation of a first circuit region (30) and a second circuit region (40).
Information query
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