Invention Application
- Patent Title: A PROCESS FOR LOW TEMPERATURE PLASMA DEPOSITION OF AN OPTICAL ABSORPTION LAYER AND HIGH SPEED OPTICAL ANNEALING
- Patent Title (中): 光吸收层的低温等离子体沉积和高速光学退火的工艺
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Application No.: PCT/US2006019030Application Date: 2006-05-16
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Publication No.: WO2006124968A3Publication Date: 2007-11-08
- Inventor: RAMASWAMY KARTIK , HANAWA HIROJI , GALLO BIAGIO , COLLINS KENNETH S , MA KAI , PARIHAR VIJAY , JENNINGS DEAN , MAYUR ABHILASH , AL-BAYATI AMIR , NGUYEN ANDREW
- Applicant: APPLIED MATERIALS INC
- Assignee: APPLIED MATERIALS INC
- Current Assignee: APPLIED MATERIALS INC
- Priority: US13189905 2005-05-17
- Main IPC: G01J1/40
- IPC: G01J1/40
Abstract:
A method of processing a workpiece includes introducing an optical absorber material precursor gas into a chamber containing the workpiece, generating an RF oscillating toroidal plasma current in a reentrant path that includes a process zone overlying the workpiece by applying RF source power, so as to deposit a layer of an optical absorber material on the workpiece, and exposing the workpiece to optical radiation that is at least partially absorbed in the optical absorber layer.
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