Invention Application
- Patent Title: SYSTEM AND METHOD FOR CONTINUOUS DEPOSITION OF GRADED COATINGS
- Patent Title (中): 用于连续沉积涂层的系统和方法
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Application No.: PCT/US2006047919Application Date: 2006-12-14
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Publication No.: WO2007117294A3Publication Date: 2008-01-10
- Inventor: KIM TAE WON , DUGGAL ANIL RAJ , MCCONNELEE PAUL ALAN , RUMSEY MICHAEL ANTHONY , SCHAEPKENS MARC , WIRTH REINHOLD FRANZ , YAN MIN , ERLAT AHMET GUN , FEIST THOMAS PAUL
- Applicant: GEN ELECTRIC , KIM TAE WON , DUGGAL ANIL RAJ , MCCONNELEE PAUL ALAN , RUMSEY MICHAEL ANTHONY , SCHAEPKENS MARC , WIRTH REINHOLD FRANZ , YAN MIN , ERLAT AHMET GUN , FEIST THOMAS PAUL
- Assignee: GEN ELECTRIC,KIM TAE WON,DUGGAL ANIL RAJ,MCCONNELEE PAUL ALAN,RUMSEY MICHAEL ANTHONY,SCHAEPKENS MARC,WIRTH REINHOLD FRANZ,YAN MIN,ERLAT AHMET GUN,FEIST THOMAS PAUL
- Current Assignee: GEN ELECTRIC,KIM TAE WON,DUGGAL ANIL RAJ,MCCONNELEE PAUL ALAN,RUMSEY MICHAEL ANTHONY,SCHAEPKENS MARC,WIRTH REINHOLD FRANZ,YAN MIN,ERLAT AHMET GUN,FEIST THOMAS PAUL
- Priority: US31524805 2005-12-23
- Main IPC: C23C14/56
- IPC: C23C14/56 ; C23C16/54
Abstract:
Embodiments of the invention include a deposition machine that allows for continuous deposition of an object or substrate with a coating having a graded composition. The deposition machine includes a deposition chamber separated into a plurality of chamber areas by a baffle having an opening. The opening allows for migration of deposition material from one chamber area to another, allowing for a graded composition coating to be deposited on the object or substrate. Other embodiments include a system for forming an electronic device and a system and method for forming a graded composition on an object.
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