Invention Application
- Patent Title: PRODUCING SOI STRUCTURE USING ION SHOWER
- Patent Title (中): 使用离子水生产SOI结构
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Application No.: PCT/US2007/012360Application Date: 2007-05-24
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Publication No.: WO2007142852A2Publication Date: 2007-12-13
- Inventor: CITES, Jeffrey, S. , GADKAREE, Kishor, P. , MASCHMEYER, Richard, O.
- Applicant: CORNING INCORPORATED , CITES, Jeffrey, S. , GADKAREE, Kishor, P. , MASCHMEYER, Richard, O.
- Applicant Address: 1 Riverfront Plaza Corning, New York 14831 US
- Assignee: CORNING INCORPORATED,CITES, Jeffrey, S.,GADKAREE, Kishor, P.,MASCHMEYER, Richard, O.
- Current Assignee: CORNING INCORPORATED,CITES, Jeffrey, S.,GADKAREE, Kishor, P.,MASCHMEYER, Richard, O.
- Current Assignee Address: 1 Riverfront Plaza Corning, New York 14831 US
- Agency: SCOTT, Steven, J.
- Priority: US11/445,036 20060531
Abstract:
Disclosed are methods for making SOI and SOG structures using ion shower for implanting ions to the donor substrate. The ion shower provides expedient, efficient, low-cost and effective ion implantation while minimizing damage to the exfoliation film.
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