Invention Application
- Patent Title: GETTER AND CLEANING ARRANGEMENT FOR A LITHOGRAPHIC APPARATUS
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Application No.: PCT/NL2007/050318Application Date: 2007-06-28
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Publication No.: WO2008007952A3Publication Date: 2008-01-17
- Inventor: VAN HERPEN, Maarten, Marinus, Johannes, Wilhelmus , BANINE, Vadim, Yevgenyevich , MOORS, Johannes, Hubertus, Josephina , SOER, Wouter, Anthon
- Applicant: ASML NETHERLANDS B.V. , VAN HERPEN, Maarten, Marinus, Johannes, Wilhelmus , BANINE, Vadim, Yevgenyevich , MOORS, Johannes, Hubertus, Josephina , SOER, Wouter, Anthon
- Applicant Address: De Run 6501 NL-5504 DR Veldhoven NL
- Assignee: ASML NETHERLANDS B.V.,VAN HERPEN, Maarten, Marinus, Johannes, Wilhelmus,BANINE, Vadim, Yevgenyevich,MOORS, Johannes, Hubertus, Josephina,SOER, Wouter, Anthon
- Current Assignee: ASML NETHERLANDS B.V.,VAN HERPEN, Maarten, Marinus, Johannes, Wilhelmus,BANINE, Vadim, Yevgenyevich,MOORS, Johannes, Hubertus, Josephina,SOER, Wouter, Anthon
- Current Assignee Address: De Run 6501 NL-5504 DR Veldhoven NL
- Agency: VAN WESTENBRUGGE, Andries
- Priority: US11/486,386 20060714
- Main IPC: G03F7/20
- IPC: G03F7/20 ; B08B7/00
Abstract:
A lithographic apparatus includes a radiation source and an object (301) with a first surface (302) which is configured to retain metal contaminants. This surface has the function of a getter. The first surface is arranged substantially outside the region traversed by the radiation beam generated by the radiation source during lithographic processing. The first surface may further be used to retain volatile contaminants generated in a cleaning method.
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