公开(公告)号：WO2009152885A1

公开(公告)日：2009-12-23

申请号：PCT/EP2009/001581

申请日：2009-03-06

Applicant: CARL ZEISS SMT AG ,  ASML NETHERLANDS B.V. ,  EHM, Dirk, Heinrich ,  STORM, Arnoldus Jan ,  MOORS, Johannes Hubertus Josephina ,  CZAP, Almut ,  NAGEL, Mona ,  VAN DER DONCK, Jacques, Cor, Johan ,  STORTELDER, Jetske ,  SANDTKE, Marijn ,  CABALLERO, Maria, Isabel, Catalina ,  SCACCABAROZZI, Luigi ,  SCHMIDT, Stefan ,  KRAUS, Dieter ,  WIESNER, Stefan ,  KÖHLER, Stefan ,  CHUNG, Hin Yiu Anthony

Inventor： EHM, Dirk, Heinrich ,  STORM, Arnoldus Jan ,  MOORS, Johannes Hubertus Josephina ,  CZAP, Almut ,  NAGEL, Mona ,  VAN DER DONCK, Jacques, Cor, Johan ,  STORTELDER, Jetske ,  SANDTKE, Marijn ,  CABALLERO, Maria, Isabel, Catalina ,  SCACCABAROZZI, Luigi ,  SCHMIDT, Stefan ,  KRAUS, Dieter ,  WIESNER, Stefan ,  KÖHLER, Stefan ,  CHUNG, Hin Yiu Anthony

IPC: G03F7/20 ,  G21K1/00

CPC classification number: G03F7/70925 ,  B82Y10/00 ,  G03F7/7085 ,  G03F7/70916 ,  G03F7/70975 ,  G03F7/70983 ,  G21K1/062

Abstract: An optical assembly serves the purpose of being mounted in a projection exposure apparatus (101) for EUV microlithography and comprises at least one vacuum chamber (70, 71, 68a), at least one optical element (6, 7; 65, 66; 63) arranged in the vacuum chamber (70, 71, 68a), the optical element (6, 7; 65, 66; 63) having an optical surface (18) which may be impinged upon by a useful beam bundle (3) of the projection exposure apparatus (101), and a cleaning device (72) for cleaning the optical surface (18). The cleaning device (72) is configured to perform particle cleaning of the optical surface (18) at a gas pressure within the vacuum chamber (70,71, 68a) which is higher than a vacuum pressure (p0) for performing an exposure operation with the projection exposure apparatus (101). The result is an optical assembly capable of providing optical elements having an optical surface which may be impinged upon by a useful beam bundle which can be cleaned reliably from foreign particles.

Abstract translation: 光学组件用于安装在用于EUV微光刻的投影曝光设备（101）中，并且包括至少一个真空室（70,71,68a），至少一个光学元件（6,7; 65,66,63 ），所述光学元件（6,7; 65,66,63）具有光学表面（18），所述光学表面可被所述真空室（70,71,68a）的有用光束束（3）撞击 投影曝光装置（101）和用于清洁光学表面（18）的清洁装置（72）。 清洁装置（72）构造成在真空室（70,71,68a）内的气体压力下进行光学表面（18）的粒子清洁，该气体压力高于用于进行曝光操作的真空压力（p0） 投影曝光装置（101）。 其结果是能够提供光学元件的光学组件，该光学元件具有光学表面，该光学表面可以被可以被外界颗粒可靠地清洁的有用束束撞击。

公开(公告)号：WO2009129960A1

公开(公告)日：2009-10-29

申请号：PCT/EP2009/002782

申请日：2009-04-16

Applicant: ASML NETHERLANDS B. V., ,  SCACCABAROZZI, Luigi ,  IVANOV, Vladimir, Vitalevitch ,  KOSHELEV, Konstantin, Nikolaevich ,  MOORS, Johannes, Hubertus, Josephina ,  STEVENS, Lucas, Henricus, Johannes ,  ANTSIFEROV, Pavel, Stanislavovich ,  KRIVTSUN, Vladimir, Mihailovitch ,  DOROKHIN, Leonid, Alexandrovich ,  VAN KAMPEN, Maarten

Inventor： SCACCABAROZZI, Luigi ,  IVANOV, Vladimir, Vitalevitch ,  KOSHELEV, Konstantin, Nikolaevich ,  MOORS, Johannes, Hubertus, Josephina ,  STEVENS, Lucas, Henricus, Johannes ,  ANTSIFEROV, Pavel, Stanislavovich ,  KRIVTSUN, Vladimir, Mihailovitch ,  DOROKHIN, Leonid, Alexandrovich ,  VAN KAMPEN, Maarten

IPC: G03F7/20

CPC classification number: G03F7/70925

Abstract: A lithographic apparatus includes an illumination system configured to condition a beam of radiation, and a support structure configured to support a patterning device. The patterning device is configured to impart a pattern to the beam of radiation. The apparatus includes a patterning device cleaning system configured to provide an electrostatic force to contaminant particles that are on the patterning device and that are electrically charged by the beam of radiation, in order to remove the contaminant particles from the patterning device.

Abstract translation: 光刻设备包括被配置为调节辐射束的照明系统和被配置为支撑图案形成装置的支撑结构。 图案形成装置被配置为向辐射束施加图案。 该装置包括图案形成装置清洁系统，该图案形成装置清洁系统被配置为向图案形成装置上的污染物颗粒提供静电力，并且由辐射束对其进行带电，以便从图案形成装置移除污染物颗粒。

公开(公告)号：WO2009106291A1

公开(公告)日：2009-09-03

申请号：PCT/EP2009/001299

申请日：2009-02-24

Applicant: ASML NETHERLANDS B V ,  SOER, Wouter, Anthon ,  BANINE, Vadim, Yevgenyevich ,  MOORS, Johannes, Hubertus, Josephina ,  VAN HERPEN, Maarten, Marinus, Johannes, Wilhelmus ,  YAKURIN, Andrey, Mikhailovich

Inventor： SOER, Wouter, Anthon ,  BANINE, Vadim, Yevgenyevich ,  MOORS, Johannes, Hubertus, Josephina ,  VAN HERPEN, Maarten, Marinus, Johannes, Wilhelmus ,  YAKURIN, Andrey, Mikhailovich

IPC: G02B5/20 ,  G02B5/22 ,  G02B5/26 ,  G03F7/20 ,  G21K1/06 ,  G02B5/08

CPC classification number: G02B5/208 ,  B82Y10/00 ,  G02B5/0891 ,  G02B5/22 ,  G02B5/26 ,  G03F7/70191 ,  G03F7/702 ,  G03F7/70575 ,  G03F7/70958 ,  G21K1/067 ,  G21K2201/061 ,  G21K2201/064 ,  G21K2201/065 ,  G21K2201/067

Abstract: An optical element includes a first layer (4) that includes a first material, and is configured to be substantially reflective for radiation of a first wavelength and substantially transparent for radiation of a second wavelength. The optical element includes a second layer (2) that includes a second material, and is configured to be substantially absorptive or transparent for the radiation of the second wavelength. The optical element includes a third layer (3) that includes a third material between the first layer and the second layer, and is substantially transparent for the radiation of the second wavelength and configured to reduce reflection of the radiation of the second wavelength from a top surface of the second layer facing the first layer. The first layer is located upstream in the optical path of incoming radiation with respect to the second layer in order to improve spectral purity of the radiation of the first wavelength.

Abstract translation: 光学元件包括包括第一材料的第一层（4），并且被配置为基本反射第一波长的辐射并且对于第二波长的辐射基本上是透明的。 光学元件包括第二层（2），其包括第二材料，并且被配置为对于第二波长的辐射是基本吸收或透明的。 光学元件包括第三层（3），其包括在第一层和第二层之间的第三材料，并且对于第二波长的辐射基本上是透明的，并且被配置为减少第二波长的辐射从顶部 第二层的表面面向第一层。 为了提高第一波长的辐射的光谱纯度，第一层相对于第二层位于入射辐射的光路中的上游。

公开(公告)号：WO2008130231A1

公开(公告)日：2008-10-30

申请号：PCT/NL2008/050225

申请日：2008-04-18

Applicant: ASML NETHERLANDS B.V. ,  BANINE, Vadim Yevgenyevich ,  BLEEKER, Arno Jan ,  MOORS, Johannes Hubertus Josephina

Inventor： BANINE, Vadim Yevgenyevich ,  BLEEKER, Arno Jan ,  MOORS, Johannes Hubertus Josephina

IPC: G03F7/20

CPC classification number: G03F7/70291 ,  B82Y10/00 ,  G03F7/70033 ,  G03F7/70191

Abstract: A lithographic apparatus for maskless EUV applications includes an illumination system constructed and arranged to condition a radiation beam and to supply the conditioned radiation beam to a spatial light modulator, a substrate table constructed and arranged to hold a substrate, and a projection system constructed and arranged to project the conditioned radiation beam onto a target portion of the substrate. The illumination system includes a field facet mirror constructed and arranged to define a field of the conditioned radiation beam. The field facet mirror is constructed and arranged to optically match a source of radiation and the illumination system.

Abstract translation: 用于无掩模EUV应用的光刻设备包括被构造和布置成调节辐射束并且将经调节的辐射束提供给空间光调制器的照明系统，被构造和布置成保持衬底的衬底台，以及构造和布置的投影系统 以将调节的辐射束投影到基板的目标部分上。 照明系统包括构造和布置成限定经调节的辐射束的场的场面反射镜。 场面反射镜被构造和布置成光学匹配辐射源和照明系统。

公开(公告)号：WO2008078993A2

公开(公告)日：2008-07-03

申请号：PCT/NL2007/050661

申请日：2007-12-18

Applicant: ASML NETHERLANDS B.V. ,  CARL ZEISS SMT AG ,  STORM, Arnoldus Jan ,  MOORS, Johannes Hubertus Josephina ,  WOLSCHRIJN, Bastiaan Theodoor ,  EHM, Dirk Heinrich

Inventor： STORM, Arnoldus Jan ,  MOORS, Johannes Hubertus Josephina ,  WOLSCHRIJN, Bastiaan Theodoor ,  EHM, Dirk Heinrich

IPC: G03F7/20

CPC classification number: G03F7/70925 ,  G03F7/70058 ,  G03F7/70916

Abstract: A lithographic apparatus that includes an illumination system configured to condition a radiation beam. The illumination system includes a plurality of optical components. The apparatus also includes a support constructed to support a patterning device. The patterning device is capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam. The apparatus further includes a substrate table constructed to hold a substrate, and a projection system configured to project the patterned radiation beam onto a target portion of the substrate. The projection system includes a plurality of optical components. The apparatus also includes a contamination measurement unit for measuring contamination of a surface of at least one of the optical components. The contamination measurement unit is provided with a radiation sensor constructed and arranged to measure an optical characteristic of radiation received from the surface.

Abstract translation: 一种光刻设备，包括配置成调节辐射束的照明系统。 照明系统包括多个光学部件。 该装置还包括构造成支撑图案形成装置的支撑件。 图案形成装置能够在其横截面中赋予辐射束图案以形成图案化的辐射束。 该装置还包括被构造成保持基板的基板台，以及配置成将图案化的辐射束投影到基板的目标部分上的投影系统。 投影系统包括多个光学部件。 该装置还包括用于测量至少一个光学部件的表面的污染物的污染测量单元。 污染测量单元设置有辐射传感器，其被构造和布置成测量从表面接收的辐射的光学特性。

公开(公告)号：WO2005064401A2

公开(公告)日：2005-07-14

申请号：PCT/NL2004/000928

申请日：2004-12-31

Applicant: ASML NETHERLANDS B.V. ,  BANINE, Vadim, Yevgenyevich ,  BAKKER, Levinus, Pieter ,  MOORS, Johannes, Hubertus, Josephina ,  IVANOV, Vladimir, Vitalevitch ,  ZUKAVISHVILI, Givi, Georgievitch ,  VEEFKIND, Abraham

Inventor： BANINE, Vadim, Yevgenyevich ,  BAKKER, Levinus, Pieter ,  MOORS, Johannes, Hubertus, Josephina ,  IVANOV, Vladimir, Vitalevitch ,  ZUKAVISHVILI, Givi, Georgievitch ,  VEEFKIND, Abraham

IPC: G03F7/00

CPC classification number: G03F7/70916 ,  G03F7/70983

Abstract: A lithographic apparatus is disclosed. The apparatus includes an illumination system that provides a beam of radiation, and a support structure that supports a patterning structure. The patterning structure is configured to impart the beam of radiation with a pattern in its cross-section. The apparatus also includes a substrate support that supports a substrate, a projection system that projects the patterned beam onto a target portion of the substrate, and a debris-mitigation system that mitigates debris particles which are formed during use of at least a part of the lithographic apparatus. The debris-mitigation system is arranged to apply a magnetic field so that at least charged debris particles are mitigated.

Abstract translation: 公开了一种光刻设备。 该设备包括提供辐射束的照明系统和支撑图案化结构的支撑结构。 构图结构被构造成在其横截面中赋予辐射束图案。 该设备还包括支撑衬底的衬底支撑件，将图案化的束投影到衬底的目标部分上的投影系统，以及缓解在使用该衬底的至少一部分期间形成的碎片颗粒的碎片缓解系统 光刻设备。 碎片缓解系统被布置成施加磁场，以至少减少带电碎片颗粒。

公开(公告)号：WO2010017892A1

公开(公告)日：2010-02-18

申请号：PCT/EP2009/005509

申请日：2009-07-30

Applicant: ASML NETHERLANDS B.V. ,  BANINE, Vadim, Yevgenyevich ,  LOOPSTRA, Erik, Roelof ,  MOORS, Johannes, Hubertus, Josephina

Inventor： BANINE, Vadim, Yevgenyevich ,  LOOPSTRA, Erik, Roelof ,  MOORS, Johannes, Hubertus, Josephina

IPC: G03F7/20 ,  H05G2/00

CPC classification number: G03F7/70916 ,  G03F7/70033 ,  G03F7/70175 ,  G03F7/70883 ,  G03F7/70908 ,  G03F7/70983 ,  H05G2/003

Abstract: A lithographic apparatus (1) includes a radiation source (SO) configured to produce extreme ultraviolet radiation, the radiation source (SO) including a chamber (210) in which a plasma (225) is generated; a collector mirror (270) configured to reflect radiation emitted by the plasma (225); and a debris mitigation system (230) including a gas supply system (235) configured to supply a first gas flow (240) toward the plasma, the first gas flow (240) being selected to thermalize debris generated by the plasma (225), and a plurality of gas manifolds (247) arranged at a location proximate the collector mirror (270), the gas manifolds configured to supply a second gas flow (250) in the chamber (210), the second gas flow (250) being directed toward the plasma (225) to prevent thermalized debris from depositing on the collector mirror (270).

Abstract translation: 光刻设备（1）包括被配置为产生极紫外辐射的辐射源（SO），所述辐射源（SO）包括其中产生等离子体（225）的腔室（210） 被配置为反射由所述等离子体（225）发射的辐射的收集器反射镜（270）; 以及包括气体供应系统（235）的碎片减缓系统（230），所述气体供应系统（235）被配置为朝向所述等离子体供应第一气流（240），所述第一气体流（240）被选择为热等离子体（225）产生的碎片， 和多个气体歧管（247），其布置在靠近收集器反射镜（270）的位置处，所述气体歧管被配置为在所述腔室（210）中提供第二气流（250），所述第二气体流（250）被引导 朝向等离子体（225），以防止热碎的碎屑沉积在收集器反射镜（270）上。

公开(公告)号：WO2010017890A1

公开(公告)日：2010-02-18

申请号：PCT/EP2009/005488

申请日：2009-07-29

Applicant: ASML NETHERLANDS B.V. ,  YAKUNIN, Andrey, Mikhailovich ,  BANINE, Vadim, Yevgenyevich ,  MOORS, Johannes, Hubertus, Josephina ,  SJAMENOK, Leonid, Aizikovitch

Inventor： YAKUNIN, Andrey, Mikhailovich ,  BANINE, Vadim, Yevgenyevich ,  MOORS, Johannes, Hubertus, Josephina ,  SJAMENOK, Leonid, Aizikovitch

IPC: G03F7/20 ,  G02B5/20

CPC classification number: G03F7/70958 ,  B82Y10/00 ,  G02B5/208 ,  G03F7/70033 ,  G03F7/70191 ,  G03F7/70575 ,  G03F7/70941 ,  G21K1/062 ,  G21K1/10

Abstract: A spectral purity filter is configured to transmit extreme ultraviolet (EUV) radiation and deflect or absorb non-EUV secondary radiation. In an embodiment, the spectral purity filter includes a body of material highly transmissive of EUV radiation and a layer of material highly reflective of non-EUV secondary radiation located on a radiation incident side of the body. In an embodiment, the spectral purity filter includes a body of material highly transmissive of EUV radiation and a layer of high emissivity material on an end of the body.

Abstract translation: 光谱纯度滤光器被配置为透射极紫外（EUV）辐射并偏转或吸收非EUV次级辐射。 在一个实施例中，光谱纯度滤光器包括高度透射EUV辐射的材料体和高度反射位于身体辐射入射侧的非EUV次级辐射的材料层。 在一个实施例中，光谱纯度滤光器包括在EUV辐射高度透射的材料体和在身体端部上的高发射率材料层。

公开(公告)号：WO2009123446A1

公开(公告)日：2009-10-08

申请号：PCT/NL2009/050151

申请日：2009-03-27

Applicant: ASML NETHERLANDS B.V. ,  BRUINSMA, Anastasius Jacobus Anicetus ,  MOORS, Johannes Hubertus Josephina ,  STEVENS, Lucas Henricus Johannes ,  VEEFKIND, Abraham ,  BUSSINK, Peter Gerhardus Wilhelmus ,  BROUWER, Egbert Anne Martijn

Inventor： BRUINSMA, Anastasius Jacobus Anicetus ,  MOORS, Johannes Hubertus Josephina ,  STEVENS, Lucas Henricus Johannes ,  VEEFKIND, Abraham ,  BUSSINK, Peter Gerhardus Wilhelmus ,  BROUWER, Egbert Anne Martijn

IPC: G03F7/20 ,  G01N21/00 ,  G01B11/00

CPC classification number: G03F7/70916 ,  G01N21/94 ,  G03F7/70525 ,  G03F7/70566 ,  G03F7/70591 ,  G03F7/70808 ,  G03F7/7085 ,  G03F7/70941

Abstract: A lithographic apparatus (1) includes a vessel (5) that encloses a component (40) with a test surface (4) to be probed for contamination control; and an optical probe configured to transmit and receive an optical probing beam (2). The vessel (5) includes a first optical port (8) configured to transfer the optical probing beam (2) towards the test surface (4), and a second optical port (9) configured to receive a reflected optical probing beam (3). The optical probe includes a light source (10) configured to provide the optical probing beam (2), a polarization conditioner (11) configured to provide a predefined polarization state to the probing beam (2), and a spectral analyzer (12). The polarization conditioner (11) is preset to provide a minimal transmission for a minimal transmission wavelength, and the spectral analyzer (12) is arranged to detect a wavelength shift of the minimal transmission wavelength in response to a polarization change due to the presence of contamination.

Abstract translation: 光刻设备（1）包括容器（5），其包围具有待探测以进行污染控制的测试表面（4）的部件（40）; 以及被配置为发送和接收光学探测光束（2）的光学探针。 容器（5）包括被配置为将光学探测光束（2）传送到测试表面（4）的第一光学端口（8）和被配置为接收反射的光学探测光束（3）的第二光学端口（9） 。 光探头包括被配置为提供光学探测光束（2）的光源（10），被配置为向探测光束（2）提供预定极化状态的偏振调节器（11）和光谱分析器（12）。 偏振调节器（11）被预置为为最小传输波长提供最小传输，并且频谱分析器（12）被布置成响应于由于存在污染而导致的偏振变化来检测最小传输波长的波长漂移 。

公开(公告)号：WO2009070013A1

公开(公告)日：2009-06-04

申请号：PCT/NL2008/050731

申请日：2008-11-18

Applicant: ASML NETHERLANDS B.V. ,  VAN DE VIJVER, Yuri Johannes Gabriël ,  MOORS, Johannes Hubertus Josephina ,  VERSTEEG, Wendelin Johanna Maria ,  JONKERS, Peter Gerardus

Inventor： VAN DE VIJVER, Yuri Johannes Gabriël ,  MOORS, Johannes Hubertus Josephina ,  VERSTEEG, Wendelin Johanna Maria ,  JONKERS, Peter Gerardus

IPC: G03F7/20

CPC classification number: G03F7/70933 ,  G03F7/70841 ,  G03F7/70866 ,  G03F7/70883 ,  G03F7/70916

Abstract: A lithographic apparatus (1) is disclosed that includes a projection system (7) configured to project a patterned radiation beam (9) onto a target portion of a substrate, a vacuum chamber (8) through which the patterned beam of radiation (9) is projected during use, and a purge (13, 16, 17) system configured to provide a purge gas flow in the chamber (8).

Abstract translation: 公开了一种光刻设备（1），其包括投影系统（7），其配置成将图案化的辐射束（9）投影到基板的目标部分上;真空室（8），图案化的辐射束（9） 并且被配置为在所述腔室（8）中提供净化气体流的吹扫（13,16,17）系统。