Invention Application
WO2008021894A3 METHOD AND APPARATUS FOR MONITORING AND CONTROL OF SUCK BACK LEVEL IN A PHOTORESIST DISPENSE SYSTEM
审中-公开
用于监视和控制光电复原系统中回退级别的方法和装置
- Patent Title: METHOD AND APPARATUS FOR MONITORING AND CONTROL OF SUCK BACK LEVEL IN A PHOTORESIST DISPENSE SYSTEM
- Patent Title (中): 用于监视和控制光电复原系统中回退级别的方法和装置
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Application No.: PCT/US2007075498Application Date: 2007-08-08
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Publication No.: WO2008021894A3Publication Date: 2008-07-31
- Inventor: PORRAS ERICA R , RAMANAN NATARAJAN
- Applicant: SOKUDO CO LTD , PORRAS ERICA R , RAMANAN NATARAJAN
- Assignee: SOKUDO CO LTD,PORRAS ERICA R,RAMANAN NATARAJAN
- Current Assignee: SOKUDO CO LTD,PORRAS ERICA R,RAMANAN NATARAJAN
- Priority: US83744106 2006-08-11; US69146807 2007-03-26
- Main IPC: B67D7/08
- IPC: B67D7/08 ; G03F7/16 ; B05C11/10
Abstract:
An apparatus for monitoring a position of a semiconductor process fluid interface in a dispense nozzle includes an extended optical source adapted to provide an optical beam propagating along an optical path. The optical beam is characterized by a path width measured in a first direction aligned with a dispense direction. The apparatus also includes an optical detector coupled to the optical path and adapted to detect at least a portion of the optical beam and a dispense nozzle disposed along the optical path at a location between the extended optical source and the optical detector. The apparatus further includes a nozzle positioning member coupled to the dispense nozzle and adapted to translate the dispense nozzle in the first direction.
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