Invention Application
- Patent Title: RADIATION SYSTEM AND LITHOGRAPHIC APPARATUS
- Patent Title (中): 辐射系统和光刻设备
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Application No.: PCT/NL2007050645Application Date: 2007-12-13
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Publication No.: WO2008072962A3Publication Date: 2008-10-16
- Inventor: VAN HERPEN MAARTEN MARINUS JOHANNES WILHELMUS , BANINE VADIM YEVGENYEVICH , IVANOV VLADIMIR VITALEVITCH , KOSHELEV KONSTANTIN NIKOLAEVITCH , KLUNDER DERK JAN WILFRED
- Applicant: ASML NETHERLANDS BV , VAN HERPEN MAARTEN MARINUS JOHANNES WILHELMUS , BANINE VADIM YEVGENYEVICH , IVANOV VLADIMIR VITALEVITCH , KOSHELEV KONSTANTIN NIKOLAEVITCH , KLUNDER DERK JAN WILFRED
- Assignee: ASML NETHERLANDS BV,VAN HERPEN MAARTEN MARINUS JOHANNES WILHELMUS,BANINE VADIM YEVGENYEVICH,IVANOV VLADIMIR VITALEVITCH,KOSHELEV KONSTANTIN NIKOLAEVITCH,KLUNDER DERK JAN WILFRED
- Current Assignee: ASML NETHERLANDS BV,VAN HERPEN MAARTEN MARINUS JOHANNES WILHELMUS,BANINE VADIM YEVGENYEVICH,IVANOV VLADIMIR VITALEVITCH,KOSHELEV KONSTANTIN NIKOLAEVITCH,KLUNDER DERK JAN WILFRED
- Priority: US63793706 2006-12-13
- Main IPC: H05G2/00
- IPC: H05G2/00 ; G03F7/20
Abstract:
The invention relates to a radiation system for generating electromagnetic radiation. The radiation system includes a pair of electrodes (5) constructed and arranged to generate plasma of a first substance and a pinch (10) in the plasma. The radiation system also includes a plasma recombination surface (13) that is arranged proximate to the pinch, and is configured to neutralize a plurality of plasma particles.
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