SYSTEM FOR SELECTIVELY PROCESSING A SAMPLE
    1.
    发明申请
    SYSTEM FOR SELECTIVELY PROCESSING A SAMPLE 审中-公开
    选择一种样品的系统

    公开(公告)号:WO2012004719A3

    公开(公告)日:2012-03-22

    申请号:PCT/IB2011052935

    申请日:2011-07-04

    Abstract: The invention relates to a method and a system (100) for selectively processing a sample (130) according to one of a plurality of different assays, for example for detecting a certain target component in the sample. The system comprises a plurality of "specific reagent reservoirs" (120) that contain different sets of reagents, wherein each set is required for one of the assays. Moreover, the system (100) comprises a "universal reagent reservoir" in which reagents for several assays are provided, preferably reagents for all assays. The universal reagent reservoir may preferably be a cartridge (110) in which the processing of a sample (130) can take place and which comprises a plurality of binding sites that are selective for different target components. Depending on the assay to be performed with a sample (130) at hand, the appropriate specific reagent reservoir (121b) is chosen and processed in the universal cartridge (110). This can particularly be done by a manipulator (140) in a high-throughput automated laboratory system.

    Abstract translation: 本发明涉及用于根据多种不同测定中的一种选择性处理样品(130)的方法和系统(100),例如用于检测样品中某一目标成分。 该系统包括多个含有不同试剂组的“特异性试剂储存器”(120),其中每种试剂均需要每组。 此外,系统(100)包括“通用试剂储库”,其中提供用于几种测定的试剂,优选用于所有测定的试剂。 通用试剂储存器可以优选地是其中样品(130)的处理可以发生并且包括对不同目标组分是选择性的多个结合位点的盒(110)。 根据将要用手的样品(130)进行的测定,在通用盒(110)中选择并处理适当的特定试剂储存器(121b)。 这可以通过高通量自动化实验室系统中的机械手(140)来进行。

    ARRANGEMENT FOR CLEANING A SURFACE IN A LITHOGRAPHIC APPARATUS
    4.
    发明申请
    ARRANGEMENT FOR CLEANING A SURFACE IN A LITHOGRAPHIC APPARATUS 审中-公开
    用于清洁地平面设备中的表面的布置

    公开(公告)号:WO2008002134A3

    公开(公告)日:2008-03-13

    申请号:PCT/NL2007050308

    申请日:2007-06-27

    CPC classification number: G03F7/70925 B08B7/00

    Abstract: A Gleaning arrangement (250) is provided for use in an EUV lithographic apparatus, for example an EUV lithographic apparatus with a Sn source. The cleaning arrangement includes a gas source (700) for a hydrogen containing gas (100) and a hydrogen radical source (103). The hydrogen radical source is a source of (UV) radiation which induces photo dissociation of the hydrogen. Radicals (96) may reduce Sn oxides (if present) and may form volatile hydrides of Sn deposition (203) and/or carbon deposition (203). In this way the cleaning arrangement can be used to clean optical elements (201) from Sn and/or C deposition. The EUV source may be used as hydrogen radical source (103). An optical filter is used to remove undesired EUV radiation and transmit desired UV radiation.

    Abstract translation: 提供清洗装置(250)用于EUV光刻设备,例如具有Sn源的EUV光刻设备。 清洁装置包括用于含氢气体(100)和氢根源(103)的气体源(700)。 氢自由基源是(UV)辐射源,其诱导氢的光解离。 自由基(96)可以减少Sn氧化物(如果存在),并且可以形成Sn沉积(203)和/或碳沉积(203)的挥发性氢化物。 以这种方式,清洁装置可用于从Sn和/或C沉积物清洁光学元件(201)。 EUV源可以用作氢源(103)。 使用滤光器去除不期望的EUV辐射并传输所需的UV辐射。

    OPTICAL SYSTEM FOR MAPPING SIGNAL LIGHT ONTO A DETECTOR
    5.
    发明申请
    OPTICAL SYSTEM FOR MAPPING SIGNAL LIGHT ONTO A DETECTOR 审中-公开
    用于将信号光映射到探测器的光学系统

    公开(公告)号:WO2006103612A2

    公开(公告)日:2006-10-05

    申请号:PCT/IB2006/050917

    申请日:2006-03-27

    CPC classification number: G01N21/645 G02B27/0037 G02B27/4205 G02B27/4277

    Abstract: The invention relates to an optical system that particularly allows an improved detection of signal light propagating from a light source (1) through a flat glass substrate (11). SC-modes of this signal light that would normally be totally internally reflected at the backside (10) of the substrate (11) are coupled out by a first diffractive optical element DOE (21). To map all signal light leaving the substrate (11) onto a single target location (51), a focusing lens (31) and a second DOE (41) are disposed in the optical path behind the substrate (11). The DOEs (21, 41) may for example be a ID sinusoidal grating or a 2D blaze grating. The optical system may particularly be applied in an investigation apparatus for detecting multiple spots of a fluorescent sample material.

    Abstract translation: 本发明涉及一种特别允许改进从光源(1)通过平板玻璃基板(11)传播的信号光的检测的光学系统。 通常在基板(11)的背面(10)处内部反射的该信号光的SC模式由第一衍射光学元件DOE(21)耦合出来。 为了将离开基板(11)的所有信号光映射到单个目标位置(51)上,在基板(11)后面的光路中设置聚焦透镜(31)和第二DOE(41)。 DOE(21,41)可以例如是ID正弦光栅或2D火焰光栅。 光学系统可以特别应用于用于检测荧光样品材料的多个点的检查装置中。

    WAVELENGTH- AND POLARIZATION-DEPENDENT RING RESONATOR OPTICAL CIRCUITS

    公开(公告)号:WO2003069388A3

    公开(公告)日:2003-08-21

    申请号:PCT/NL2002/000697

    申请日:2002-11-03

    Abstract: A method for the processing of light, comprising the steps of: A. separating a first light current (41) by means of a first processing means (21) in: - a second light current (42) comprising a first signal (11) falling within a first wavelength band with a first direction of polarisation, and; - a third light current (43) comprising a second signal (12) falling within the first wavelength band with a second direction of polarisation, this second direction of polarisation being perpendicular to the first direction of polarisation; B. conversion of the third light (43) current by means of a first polarisation rotating means (31) in a fourth light current (44) whereby the second signal (12) is converted in a third signal (13) falling within the first wavelength band with a direction of polarisation equal to the first direction of polarisation, and; C. separating the fourth light current (44) by means of a second processing means (22) in: - a fifth light current (45) comprising a fourth signal (14) falling within the first wavelength band with a direction of polarisation equal to the first direction of polarisation, and; - a sixth light current (46), whereby at least one of the processing means (21, 22) comprises a resonator, preferably a ring resonator. Furthermore the invention provides a device for the processing of light according to such method.

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