Invention Application
- Patent Title: 3D TWO-PHOTON LITHOGRAPHIC MICROFABRICATION SYSTEM
- Patent Title (中): 3D三光子光刻微生物系统
-
Application No.: PCT/US2009041923Application Date: 2009-04-28
-
Publication No.: WO2009134762A3Publication Date: 2010-02-18
- Inventor: KIM DAEKEUN , SO PETER T C
- Applicant: MASSACHUSETTS INST TECHNOLOGY , KIM DAEKEUN , SO PETER T C
- Assignee: MASSACHUSETTS INST TECHNOLOGY,KIM DAEKEUN,SO PETER T C
- Current Assignee: MASSACHUSETTS INST TECHNOLOGY,KIM DAEKEUN,SO PETER T C
- Priority: US4828408 2008-04-28
- Main IPC: G02B21/06
- IPC: G02B21/06 ; G01N21/25 ; G01N21/64
Abstract:
An imaging system is provided that includes a optical pulse generator for providing an optical pulse having a spectral bandwidth and includes monochromatic waves having different wavelengths. A dispersive element receives a second optical pulse associated with the optical pulse and disperses the second optical pulse at different angles on the surface of the dispersive element depending on wavelength. One or more focal elements receives the dispersed second optical pulse produced on the dispersive element. The one or more focal element recombine the dispersed second optical pulse at a focal plane on a specimen where the width of the optical pulse is restored at the focal plane.
Information query