Invention Application
- Patent Title: EPITAXIAL LIFT OFF STACKS AND METHODS
- Patent Title (中): 外部提升关闭堆栈和方法
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Application No.: PCT/US2009045715Application Date: 2009-05-29
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Publication No.: WO2009155122A3Publication Date: 2010-02-25
- Inventor: ARCHER MELISSA , ATWATER HARRY , GMITTER THOMAS , HE GANG , HEGEDUS ANDREAS , HIGASHI GREGG , SONNENFELDT STEWART
- Applicant: ALTA DEVICES INC , ARCHER MELISSA , ATWATER HARRY , GMITTER THOMAS , HE GANG , HEGEDUS ANDREAS , HIGASHI GREGG , SONNENFELDT STEWART
- Assignee: ALTA DEVICES INC,ARCHER MELISSA,ATWATER HARRY,GMITTER THOMAS,HE GANG,HEGEDUS ANDREAS,HIGASHI GREGG,SONNENFELDT STEWART
- Current Assignee: ALTA DEVICES INC,ARCHER MELISSA,ATWATER HARRY,GMITTER THOMAS,HE GANG,HEGEDUS ANDREAS,HIGASHI GREGG,SONNENFELDT STEWART
- Priority: US5778408 2008-05-30; US10428608 2008-10-10
- Main IPC: H01L21/302
- IPC: H01L21/302
Abstract:
Embodiments of the invention generally relate to epitaxial lift off (ELO) thin films and devices and methods used to form such films and devices. The ELO thin films generally contain epitaxially grown layers which are formed on a sacrificial layer disposed on or over a substrate, such as a wafer. A support handle may be disposed on the opposite side of the epitaxial material than the substrate. The support handle may be used to stabilize the epitaxial material, such as by providing compression to the epitaxial material. Furthermore, the support handle may be used to grip and hold the epitaxial material during the etching and removal steps of the ELO process. In various embodiments, the support handle may include a pre-curved handle, a multi-layered handle, a non-uniform wax handle, and two shrinkage-induced handles which universally or unidirectional shrink to provide compression to the epitaxial material.
Information query
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