Invention Application
- Patent Title: UNDER BUMP METALLIZATION FOR ON-DIE CAPACITOR
- Patent Title (中): 用于电容器电容器的不合格金属化
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Application No.: PCT/CA2009/001039Application Date: 2009-07-23
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Publication No.: WO2010009553A1Publication Date: 2010-01-28
- Inventor: MCLELLAN, Neil , GUO, Fei , CHUNG, Daniel , CHEUNG, Terence
- Applicant: ATI TECHNOLOGIES ULC , MCLELLAN, Neil , GUO, Fei , CHUNG, Daniel , CHEUNG, Terence
- Applicant Address: 1 Commerce Valley Drive East Markham , Ontario L3T 7N6 CA
- Assignee: ATI TECHNOLOGIES ULC,MCLELLAN, Neil,GUO, Fei,CHUNG, Daniel,CHEUNG, Terence
- Current Assignee: ATI TECHNOLOGIES ULC,MCLELLAN, Neil,GUO, Fei,CHUNG, Daniel,CHEUNG, Terence
- Current Assignee Address: 1 Commerce Valley Drive East Markham , Ontario L3T 7N6 CA
- Agency: MITCHELL, Richard et al.
- Priority: US12/180,042 20080725
- Main IPC: H01G13/00
- IPC: H01G13/00 ; H01G4/30 ; H01G4/33 ; H01L21/70
Abstract:
Various on-chip capacitors and methods of making the same are disclosed. In one aspect, a method of manufacturing a capacitor is provided that includes forming a first conductor structure on a semiconductor chip and forming a passivation structure on the first conductor structure. An under bump metallization structure is formed on the passivation structure. The under bump metallization structure overlaps at least a portion of the first conductor structure to provide a capacitor.
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