Invention Application
- Patent Title: ORGANIC SOLVENT DEVELOPMENT OR MULTIPLE DEVELOPMENT PATTERN-FORMING METHOD USING ELECTRON BEAMS OR EUV RAYS
- Patent Title (中): 有机溶剂开发或使用电子束或EUV的多种开发方法
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Application No.: PCT/JP2010/053014Application Date: 2010-02-19
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Publication No.: WO2010095763A1Publication Date: 2010-08-26
- Inventor: TSUBAKI, Hideaki , SHIRAKAWA, Koji , TSUCHIHASHI, Toru
- Applicant: FUJIFILM Corporation , TSUBAKI, Hideaki , SHIRAKAWA, Koji , TSUCHIHASHI, Toru
- Applicant Address: 26-30, Nishiazabu 2-chome, Minato-ku, Tokyo 1060031 JP
- Assignee: FUJIFILM Corporation,TSUBAKI, Hideaki,SHIRAKAWA, Koji,TSUCHIHASHI, Toru
- Current Assignee: FUJIFILM Corporation,TSUBAKI, Hideaki,SHIRAKAWA, Koji,TSUCHIHASHI, Toru
- Current Assignee Address: 26-30, Nishiazabu 2-chome, Minato-ku, Tokyo 1060031 JP
- Agency: TAKAMATSU, Takeshi et al.
- Priority: JP2009-038666 20090220
- Main IPC: G03F7/32
- IPC: G03F7/32 ; G03F7/038 ; H01L21/027
Abstract:
Provided is a pattern-forming method including, in the following order: (1) a process of forming a film with an actinic ray-sensitive or radiation-sensitive resin composition comprising a resin which contains an acid-decomposable repeating unit and is capable of decreasing the solubility in an organic solvent by the action of an acid; (2) a process of exposing the film with an electron beam or an EUV ray; and (4) a process of developing the film with a developer containing an organic solvent.
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