公开(公告)号：WO2016059807A1

公开(公告)日：2016-04-21

申请号：PCT/JP2015/005242

申请日：2015-10-16

Applicant: NETUREN CO., LTD.

Inventor： TANI, Tohru ,  AKABORI, Hiroya ,  NAKA, Shigeyuki ,  YONEDA, Keiichi ,  FUJIWARA, Fumiaki ,  MURATA, Yoshiyuki

IPC: A61B18/18

CPC classification number: A61B18/1815 ,  A61B2018/00107 ,  A61B2018/00601 ,  A61B2018/00994 ,  A61B2018/1861 ,  A61B2218/007

Abstract: An organ resection tool has a first conductor configured to apply microwaves, a second conductor configured to receive the microwaves, an insulator with which at least one of the first conductor and the second conductor is partially or entirely covered, and a brush structure connected directly or indirectly to the insulator or to at least one of the first conductor and the second conductor.

Abstract translation: 器官切除工具具有构造成施加微波的第一导体，被配置为接收微波的第二导体，第一导体和第二导体中的至少一个被部分或全部覆盖的绝缘体，以及直接连接的刷结构 间接地连接到绝缘体或第一导体和第二导体中的至少一个。

公开(公告)号：WO2016006253A1

公开(公告)日：2016-01-14

申请号：PCT/JP2015/003482

申请日：2015-07-09

Applicant: NETUREN CO., LTD.

Inventor： YASUTAKE, Hidehiro ,  TANAKA, Yoshimasa

IPC: H05B6/10 ,  H05B6/36 ,  H05B6/42 ,  H05B6/44 ,  C21D1/10

CPC classification number: H05B6/103 ,  C21D1/10 ,  C21D1/42 ,  C21D1/667 ,  H05B6/101 ,  H05B6/365 ,  H05B6/42 ,  H05B6/44 ,  H05B2213/04 ,  Y02P10/253

Abstract: A heating apparatus and a heating method are provided. The heating apparatus includes a coil configured to receive AC power to form a magnetic field that inductively heats a workpiece, a spray unit configured to spray cooling fluid including a liquid to the coil in a form of mist at least during a period in which the AC power is supplied to the coil. Alternatively, the spray unit may be configured to spray the cooling fluid in the form of mist to a heating target portion of the workpiece placed in the magnetic field at least during the period in which the AC power is supplied to the coil.

Abstract translation: 提供加热装置和加热方法。 所述加热装置包括：线圈，被配置为接收AC电力以形成感应加热工件的磁场;喷射单元，被配置为至少在AC的时间段内以薄雾形式将包括液体的冷却流体喷射到所述线圈 向线圈供电。 或者，喷雾单元可以被配置为至少在将AC功率供应到线圈的时段期间将雾状的冷却流体喷射到放置在磁场中的工件的加热目标部分。

公开(公告)号：WO2015093621A2

公开(公告)日：2015-06-25

申请号：PCT/JP2014/084202

申请日：2014-12-17

Applicant: NETUREN CO., LTD.

Inventor： INABA, Hirokazu ,  KIYOSAWA, Yutaka

IPC: C21D9/08

CPC classification number: H05B6/38 ,  C21D1/10 ,  C21D1/42 ,  C21D9/08 ,  H05B6/101 ,  Y02P10/253

Abstract: To heat a workpiece having a recess portion provided along a longitudinal axis of the workpiece, the workpiece is inserted into an induction heating coil, and the induction heating coil or the workpiece is along an axial direction of the workpiece. The induction heating coil has a conductor configured to surround the workpiece around the axis of the workpiece. The conductor has a protruding portion protruding inwardly to face the recess portion of the workpiece.

Abstract translation: 为了加热具有沿着工件的纵轴设置的凹部的工件，将工件插入到感应加热线圈中，并且感应加热线圈或工件沿着工件的轴向方向。 感应加热线圈具有构造成围绕工件的轴线围绕工件的导体。 导体具有向内突出以与工件的凹部对置的突出部分。

公开(公告)号：WO2014104410A1

公开(公告)日：2014-07-03

申请号：PCT/JP2013/085349

申请日：2013-12-27

Applicant: NETUREN CO., LTD.

Inventor： SUZUKI, Ryosuke ,  NOMURA, Makoto ,  YAMAWAKI, Takashi

IPC: B23K20/12

CPC classification number: B23K20/129 ,  B23K20/12 ,  B23K2201/008 ,  B62D3/126 ,  B62D5/0442

Abstract: A rack manufacturing apparatus (100) and a rack manufacturing method are provided. The rack manufacturing apparatus includes a first support portion (110) configured to support a hollow or solid first bar (12A) on which first rack teeth are formed, a second support portion (140) configured to support a hollow or solid second bar (12B) such that an axial center line of the second bar (C2) is aligned with an axial center line of the first bar (C1), a base (20) configured to cause the second support portion (140) to approach the first support portion (110), and a rotary driving portion (130) configured to rotate the second support portion (140) about the axial center line of the second support portion (C2) relative to the first support portion (110) so as to join an end portion of the first bar (12A) and an end portion of the second bar (12B) by a friction pressure welding.

Abstract translation: 提供了一种机架制造装置（100）和机架制造方法。 机架制造装置包括：第一支撑部分（110），其构造成支撑形成有第一齿条齿的中空或实心第一杆（12A）;第二支撑部分（140），其构造成支撑中空或固体第二杆 ），使得所述第二杆（C2）的轴向中心线与所述第一杆（C1）的轴向中心线对齐;基部（20），其构造成使所述第二支撑部（140）接近所述第一支撑部 （110），以及旋转驱动部（130），其构造成使所述第二支撑部（140）相对于所述第一支撑部（110）绕所述第二支撑部（C2）的轴线中心线旋转， 第一杆（12A）的一部分和第二杆（12B）的端部通过摩擦压力焊接。

公开(公告)号：WO2014042288A1

公开(公告)日：2014-03-20

申请号：PCT/JP2013/075392

申请日：2013-09-13

Applicant: FUJIFILM CORPORATION

Inventor： KAWABATA, Takeshi ,  TSUBAKI, Hideaki ,  TAKIZAWA, Hiroo

IPC: G03F7/004 ,  G03F7/038 ,  G03F7/039 ,  G03F7/32

CPC classification number: G03F7/0388 ,  C08F8/32 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0392 ,  G03F7/0397 ,  G03F7/2002 ,  G03F7/2037 ,  G03F7/2041 ,  G03F7/30 ,  G03F7/32 ,  G03F7/325

Abstract: There is provided an actinic ray-sensitive or radiation-sensitive resin composition comprising: (A) a resin having a repeating unit represented by the specific formula and a group capable of decomposing by an action of an acid to produce a polar group; and an ionic compound represented by the specific formula, and a resist film comprising the actinic ray-sensitive or radiation-sensitive resin composition.

Abstract translation: 提供了一种光化射线敏感或辐射敏感性树脂组合物，其包含：（A）具有由具体式表示的重复单元的树脂和能够通过酸作用分解以产生极性基团的基团; 和由该具体式表示的离子化合物，以及包含光化射线敏感或辐射敏感性树脂组合物的抗蚀剂膜。

公开(公告)号：WO2014017667A1

公开(公告)日：2014-01-30

申请号：PCT/JP2013/070833

申请日：2013-07-25

Applicant: FUJIFILM CORPORATION

Inventor： TAKIZAWA, Hiroo ,  HIRANO, Shuji ,  YOKOKAWA, Natsumi ,  NIHASHI, Wataru

IPC: G03F7/038 ,  C08F212/14 ,  C08F220/28 ,  G03F7/039 ,  G03F7/32 ,  H01L21/027

CPC classification number: G03F7/0388 ,  C08F12/20 ,  C08F12/22 ,  C08F12/24 ,  C08F12/30 ,  C08F12/32 ,  C08F212/14 ,  C08F220/28 ,  C08F2220/281 ,  C09D125/18 ,  G03F7/0392 ,  G03F7/0397 ,  G03F7/11 ,  G03F7/2002 ,  G03F7/2037 ,  G03F7/2041 ,  G03F7/30 ,  G03F7/325

Abstract: There is provided an actinic ray-sensitive or radiation-sensitive resin composition comprising: (A) a resin containing a repeating unit represented by the first specific formula and a repeating unit represented by the second specific formula, wherein the content of the repeating unit represented by the first specific formula is 35 mol% or more based on all repeating units in the resin (A), a resist film formed using the actinic ray-sensitive or radiation-sensitive resin composition.

Abstract translation: 提供了一种光化射线敏感或辐射敏感性树脂组合物，其包含：（A）含有由第一特定式表示的重复单元的树脂和由第二具体式表示的重复单元，其中所述重复单元的含量 通过第一具体式为基于树脂（A）中的所有重复单元的35摩尔％以上，使用光化射线敏感性或辐射敏感性树脂组合物形成的抗蚀剂膜。

公开(公告)号：WO2014017664A1

公开(公告)日：2014-01-30

申请号：PCT/JP2013/070829

申请日：2013-07-25

Applicant: FUJIFILM CORPORATION

Inventor： HIRANO, Shuji ,  YOKOKAWA, Natsumi ,  TAKIZAWA, Hiroo ,  NIHASHI, Wataru

IPC: G03F7/039 ,  C08F212/14 ,  C08F220/26 ,  G03F7/038 ,  G03F7/32 ,  H01L21/027

CPC classification number: G03F7/0388 ,  C08F22/10 ,  C08F212/14 ,  C08F220/28 ,  G03F7/0002 ,  G03F7/0392 ,  G03F7/0397 ,  G03F7/11 ,  G03F7/2002 ,  G03F7/2037 ,  G03F7/2041 ,  G03F7/30 ,  G03F7/325 ,  G03F7/38 ,  H01L21/0274 ,  C08F2220/281 ,  C08F2220/283

Abstract: There is provided an actinic ray-sensitive or radiation-sensitive resin composition comprising (P) a resin containing a repeating unit represented by the specific formula (1) and a repeating unit represented by the specific formula (A); a resist film formed using the actinic ray-sensitive or radiation-sensitive resin composition; a pattern forming method comprising (i) a step of forming a film from the actinic ray-sensitive or radiation-sensitive resin composition, (ii) a step of exposing the film, and (iii) a step of developing the exposed film by using a developer to form a pattern; a method for manufacturing an electronic device, comprising the pattern forming method, and an electronic device manufactured by the manufacturing method of an electronic device.

Abstract translation: 提供了包含（P）包含由特定式（1）表示的重复单元的树脂和由特定式（A）表示的重复单元的光化射线敏感或辐射敏感性树脂组合物。 使用光化射线敏感性或辐射敏感性树脂组合物形成的抗蚀剂膜; 一种图案形成方法，包括（i）从光化射线敏感或辐射敏感性树脂组合物形成膜的步骤，（ii）曝光所述膜的步骤，以及（iii）通过使用 开发人员形成一个模式; 一种用于制造电子设备的方法，包括图案形成方法，以及通过电子设备的制造方法制造的电子设备。

公开(公告)号：WO2014017618A1

公开(公告)日：2014-01-30

申请号：PCT/JP2013/070256

申请日：2013-07-19

Applicant: FUJIFILM CORPORATION

Inventor： KOSHIJIMA, Kousuke ,  YAMAGUCHI, Shuhei ,  YAMAMOTO, Kei

IPC: G03F7/039 ,  C08F12/12 ,  C08F20/10 ,  C08F30/08 ,  G03F7/038 ,  G03F7/32 ,  H01L21/027

CPC classification number: G03F7/11 ,  C08F220/18 ,  C08F220/28 ,  C08L25/14 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0392 ,  G03F7/0397 ,  G03F7/0758 ,  G03F7/2041 ,  G03F7/325 ,  C08F212/12 ,  C08F220/24 ,  C08F220/34 ,  C08F2220/1858

Abstract: There is provided an actinic ray-sensitive or radiation-sensitive resin composition including: (A) a resin having a repeating unit having a group capable of decomposing by the action of an acid to generate a polar group; (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation; and (C) a component containing at least one of: a compound having at least one of a fluorine atom and a silicon atom and having basicity or capable of increasing the basicity by the action of an acid, and a resin having a CH3 partial structure in a side chain moiety and having a basicity or capable of increasing the basicity by the action of an acid, wherein a content of the repeating unit having a group capable of decomposing by the action of an acid to generate a polar group is 55% by mole or more based on a whole repeating units of the resin (A).

Abstract translation: 提供了一种光化射线敏感或辐射敏感性树脂组合物，其包括：（A）具有重复单元的树脂，其具有能够通过酸的作用分解以产生极性基团的基团; （B）能够在用光化射线或辐射照射时能产生酸的化合物; 和（C）含有以下至少一种的成分：具有氟原子和硅原子中的至少一个，具有碱性或能够通过酸的作用增加碱度的化合物，以及具有CH3部分结构的树脂 在侧链部分中具有碱性或能够通过酸的作用增加碱度，其中具有能够通过酸的作用分解以产生极性基团的基团的重复单元的含量为55％ 基于树脂（A）的整个重复单元的摩尔数以上。

公开(公告)号：WO2013187530A1

公开(公告)日：2013-12-19

申请号：PCT/JP2013/066770

申请日：2013-06-12

Applicant: FUJIFILM CORPORATION

Inventor： YAMAMOTO, Kei ,  UEBA, Ryosuke

IPC: G03F7/40

CPC classification number: G03F7/0035 ,  G03F7/0397 ,  G03F7/325 ,  G03F7/405

Abstract: A pattern forming method includes: (i) a step of forming a first film by using an actinic ray-sensitive or radiation-sensitive resin composition (I), (ii) a step of exposing the first film, (iii) a step of developing the exposed first film by using an organic solvent-containing developer to form a negative pattern, (iv) a step of forming a second film on the negative pattern by using a specific composition (II), (v) a step of increasing polarity of the specific compound compound present in the second film, and (vi) a step of removing a specific area of the second film by using the organic solvent-containing remover.

Abstract translation: 图案形成方法包括：（i）通过使用光化射线敏感或辐射敏感性树脂组合物（I）形成第一膜的步骤，（ii）暴露第一膜的步骤，（iii） 通过使用含有机溶剂的显影剂显影曝光的第一膜以形成负图案，（iv）通过使用特定组合物（II）在负图案上形成第二膜的步骤，（v）增加极性的步骤 存在于第二膜中的特定化合物，以及（vi）通过使用含有机溶剂的去除剂除去第二膜的比表面积的步骤。

公开(公告)号：WO2013180314A1

公开(公告)日：2013-12-05

申请号：PCT/JP2013/065770

申请日：2013-05-31

Applicant: FUJIFILM CORPORATION

Inventor： KAWABATA, Takeshi ,  TSUBAKI, Hideaki ,  TAKIZAWA, Hiroo ,  YOKOKAWA, Natsumi

IPC: G03F7/004 ,  C08F212/02 ,  G03F7/039 ,  H01L21/027

CPC classification number: G03F7/0388 ,  C08F12/20 ,  C08F12/22 ,  C08F12/30 ,  C08F212/14 ,  C08F212/32 ,  C08F216/10 ,  C08F216/14 ,  C08F216/1416 ,  C08F220/30 ,  C08F2220/301 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0392 ,  G03F7/0397 ,  G03F7/11 ,  G03F7/325

Abstract: There is provided an actinic ray-sensitive or radiation-sensitive resin composition comprising (P) a resin having a repeating unit (A) represented by the specific formula (I) capable of generating an acid on the side chain of the resin upon irradiation with an actinic ray or radiation, and a resist film formed with the actinic ray-sensitive or radiation-sensitive resin composition, and a pattern forming method comprising: exposing the resist film, and developing the exposed resist film, and a method for manufacturing a semiconductor device, containing the pattern forming method, and a semiconductor device manufactured by the manufacturing method of the semiconductor device.

Abstract translation: 提供了一种光化射线敏感性或辐射敏感性树脂组合物，其包含（P）具有在具有式（I）表示的重复单元（A）的树脂中，所述重复单元（A）能够在照射时在树脂的侧链上产生酸 光化射线或辐射，以及形成有光化射线敏感或辐射敏感性树脂组合物的抗蚀剂膜，以及图案形成方法，包括：使抗蚀剂膜曝光并显影曝光的抗蚀剂膜，以及半导体制造方法 包含图案形成方法的器件，以及通过半导体器件的制造方法制造的半导体器件。