Invention Application
WO2011062357A3 SHOWER HEAD ASSEMBLY AND THIN FILM DEPOSITION APPARATUS COMPRISING SAME 审中-公开
包括相同的喷头组件和薄膜沉积装置

SHOWER HEAD ASSEMBLY AND THIN FILM DEPOSITION APPARATUS COMPRISING SAME
Abstract:
The present invention relates to a shower head assembly, which can implement both atomic layer deposition and chemical vapor deposition, and to a thin film deposition apparatus comprising the shower head assembly. According to the present invention, both atomic layer deposition and chemical vapor deposition can be implemented using a single device, the economic feasibility and efficiency of the device are improved, and particles are prevented from accumulating within the device.
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