System and method for applying mask data patterns Io substrate in a lithography manufacturing process are disclosed In one embodiment, the method includes providing a parallel imaging writer system having a plurality of spatial light modulator (SLM) imaging units as ranged m one or more parallel arrays receiving a mask data pattern to be written to a substrate, processing the mask data pattern to form a ρlurality of partitioned mask data patterns corresponding to different areas of the substrate, identifying objects in an area of the substrate to be imaged by corresponding SLMs, selecting evaluation points along edges of the objects, configuring the parallel imaging writes system to image the objects using the evaluations points, and performing multiple exposure to image the objects in the area of the substrate by controlling the plurality of SLMs to write the plurality of partitioned mask data patterns m parallel