公开(公告)号：WO2010111074A1

公开(公告)日：2010-09-30

申请号：PCT/US2010/027550

申请日：2010-03-16

Applicant: PINEBROOK IMAGING SYSTEMS CORPORATION ,  CHEN, Jang, Fung ,  LAIDIG, Thomas

Inventor： CHEN, Jang, Fung ,  LAIDIG, Thomas

IPC: G03C5/00

CPC classification number: G03F7/70383 ,  G03F7/70275 ,  G03F7/70291 ,  G03F7/70508 ,  G03F7/70791

Abstract: System and method for applying mask data patterns to substrate in a lithography manufacturing process are disclosed. In one embodiment, the method includes providing a parallel imaging writer system which has a plurality of spatial light modulator (SLM) imaging units arranged in one or more parallel arrays; receiving a mask data pattern to be written to a substrate, processing the mask data pattern to form a plurality of partitioned mask data patterns corresponding to different areas of the substrate, assigning one or more SLM imaging units to handle each of the partitioned mask data pattern, controlling the plurality of SLM imaging units to write the plurality of partitioned mask data patterns to the substrate in parallel, controlling movement of the plurality of SLM imaging units to cover the different areas of the substrate, and controlling movement of the substrate to be the synchronization with continuous writing of the plurality of partitioned mask data patterns.

Abstract translation: 公开了在光刻制造工艺中将掩模数据图案应用于衬底的系统和方法。 在一个实施例中，该方法包括提供并行成像写入器系统，其具有布置在一个或多个并行阵列中的多个空间光调制器（SLM）成像单元; 接收要写入衬底的掩模数据图案，处理掩模数据图案以形成对应于衬底的不同区域的多个分割掩模数据模式，分配一个或多个SLM成像单元以处理每个分割的掩模数据模式 控制所述多个SLM成像单元并行地将所述多个分割的掩模数据图案写入所述基板，控制所述多个SLM成像单元的移动以覆盖所述基板的不同区域，并且控制所述基板的移动 与多个分割的掩模数据模式的连续写入同步。

公开(公告)号：WO2011146639A1

公开(公告)日：2011-11-24

申请号：PCT/US2011/037026

申请日：2011-05-18

Applicant: PINEBROOK IMAGING SYSTEMS CORPORATION ,  KEANE, Barry ,  LAIDIG, Thomas

Inventor： KEANE, Barry ,  LAIDIG, Thomas

IPC: G06F15/00

CPC classification number: G06T1/20 ,  G03F7/70425 ,  G06T11/40

Abstract: System and method for a parallel image processing mechanism tor applying mask data patterns to substrate in a lithography manufacturing process are disclosed. In one embodiment, the parallel image processing system includes a graphics engine configured to partition an object into a plurality of trapezoids and form an edge list for representing each of the plurality of trapezoids, and a distributor configured to receive the edge list from the graphics engine and distribute the edge list to a plurality of scan line image processing units. The system further includes a sentinel configured to synchronize operations of the plurality of scan line image processing units, and a plurality of buffers configured to store image data from corresponding scan line image processing units a«d outputs the stored image data using the sentinel.

Abstract translation: 公开了一种用于在光刻制造工艺中将掩模数据图案应用于衬底的并行图像处理机构的系统和方法。 在一个实施例中，并行图像处理系统包括被配置为将对象分割成多个梯形并形成用于表示多个梯形中的每一个的边缘列表的图形引擎，以及被配置为从图形引擎接收边缘列表的分配器 并将边缘列表分发到多个扫描线图像处理单元。 所述系统还包括被配置为同步所述多个扫描线图像处理单元的操作的哨兵以及被配置为存储来自相应的扫描线图像处理单元的图像数据的多个缓冲器，其中，所述多个缓冲器使用所述前哨输出所存储的图像数据。

公开(公告)号：WO2011075385A1

公开(公告)日：2011-06-23

申请号：PCT/US2010/059667

申请日：2010-12-09

Applicant: PINEBROOK IMAGING SYSTEMS CORPORATION ,  LAIDIG, Thomas

Inventor： LAIDIG, Thomas

IPC: G03B27/42

CPC classification number: G03F7/70291

Abstract: System and method for applying mask data patterns to substrate in a lithography manufacturing process are disclosed. In one embodiment, the method includes providing a parallel imaging writer system which has a plurality of spatial light modulator (SLM) imaging units arranged in one or more parallel arrays, receiving a mask data pattern to be written to a substrate, processing the mask data pattern to form a plurality of partitioned mask data patterns corresponding to different areas of the substrate, identifying one or more objects in an area of the substrate to be imaged by corresponding SLMs, and controlling the plurality of SLMs to write the plurality of partitioned mask data patterns in parallel by performing multiple exposures to image the one or more objects in the area of the substrate.

Abstract translation: 公开了在光刻制造工艺中将掩模数据图案应用于衬底的系统和方法。 在一个实施例中，该方法包括提供并行成像写入器系统，其具有布置在一个或多个并行阵列中的多个空间光调制器（SLM）成像单元，接收要写入衬底的掩模数据模式，处理掩模数据 形成与衬底的不同区域相对应的多个划分的掩模数据模式，通过对应的SLM识别待成像的衬底区域中的一个或多个对象，以及控制多个SLM以写入多个分割的掩模数据 通过执行多次曝光以对衬底的区域中的一个或多个对象成像来并行地形成图案。

公开(公告)号：WO2012031285A1

公开(公告)日：2012-03-08

申请号：PCT/US2011/050459

申请日：2011-09-03

Applicant: PINEBROOK IMAGING SYSTEMS CORPORATION ,  CHEN, Jang, Fung ,  LAIDIG, Thomas

Inventor： CHEN, Jang, Fung ,  LAIDIG, Thomas

IPC: G02B26/00

CPC classification number: G03B27/42 ,  G03F7/70275 ,  G03F7/70283 ,  G03F7/70291 ,  G03F7/70391 ,  G03F7/70433 ,  G03F7/70475 ,  G03F7/70491 ,  G03F7/70508

Abstract: System and method for manufacturing three-dimensional integrated circuits are disclosed. In one embodiment, the method includes providing an imaging writer system that includes a plurality of spatial light modulator (SLM) imaging units arranged in one or more parallel arrays, receiving mask data to be written to one or more layers of the three-dimensional integrated circuit, processing the mask data to form a plurality of partitioned mask data patterns corresponding to the one or more layers of the three-dimensional integrated circuit, assigning one or more SLM imaging units to handle each of the partitioned mask data pattern, and controlling the plurality of SLM imaging units to write the plurality of partitioned mask data patterns to the one or more layers of the three-dimensional integrated circuits in parallel. The method of assigning performs at least one of scaling, alignment, inter-ocular displacement, rotational factor, or substrate deformation correction.

Abstract translation: 公开了用于制造三维集成电路的系统和方法。 在一个实施例中，该方法包括提供一种成像写入器系统，该系统包括布置在一个或多个并行阵列中的多个空间光调制器（SLM）成像单元，接收要写入三维集成的一个或多个层的掩模数据 处理掩模数据以形成与三维集成电路的一层或多层相对应的多个划分的掩模数据模式，分配一个或多个SLM成像单元以处理每个分割的掩模数据模式，并且控制 多个SLM成像单元将多个划分的掩模数据图案并行地写入三维集成电路的一个或多个层。 分配方法执行缩放，对准，眼内位移，旋转因子或基底变形校正中的至少一个。

公开(公告)号：WO2011075388A1

公开(公告)日：2011-06-23

申请号：PCT/US2010/059677

申请日：2010-12-09

Applicant: PINEBROOK IMAGING SYSTEMS CORPORATION ,  LAIDIG, Thomas

Inventor： LAIDIG, Thomas

IPC: G03B27/42

CPC classification number: G03F7/70275 ,  G03F7/70258 ,  G03F7/70291 ,  G03F7/70508

Abstract: System and method for applying mask data patterns Io substrate in a lithography manufacturing process are disclosed In one embodiment, the method includes providing a parallel imaging writer system having a plurality of spatial light modulator (SLM) imaging units as ranged m one or more parallel arrays receiving a mask data pattern to be written to a substrate, processing the mask data pattern to form a ρlurality of partitioned mask data patterns corresponding to different areas of the substrate, identifying objects in an area of the substrate to be imaged by corresponding SLMs, selecting evaluation points along edges of the objects, configuring the parallel imaging writes system to image the objects using the evaluations points, and performing multiple exposure to image the objects in the area of the substrate by controlling the plurality of SLMs to write the plurality of partitioned mask data patterns m parallel

Abstract translation: 公开了用于在光刻制造工艺中应用掩模数据图案Io衬底的系统和方法。在一个实施例中，该方法包括提供并行成像写入器系统，其具有多个空间光调制器（SLM）成像单元，其范围为一个或多个并行阵列 接收要写入衬底的掩模数据模式，处理掩模数据模式以形成对应于衬底的不同区域的划分的掩模数据模式的光谱，识别要由相应的SLM成像的衬底的区域中的对象， 沿对象的边缘选择评估点，配置并行成像写入系统以使用评估点对对象进行成像，并且通过控制多个SLM来写入多个分区的多个曝光来对基板区域中的对象进行成像 掩模数据模式m并行

公开(公告)号：WO2011044361A1

公开(公告)日：2011-04-14

申请号：PCT/US2010/051823

申请日：2010-10-07

Applicant: PINEBROOK IMAGING SYSTEMS CORPORATION ,  LAIDIG, Thomas

Inventor： LAIDIG, Thomas

IPC: G03F1/00

CPC classification number: G03F7/70291 ,  G03F7/70475 ,  G03F7/70508

Abstract: System and method for processing image data between adjacent imaging areas in a lithography manufacturing process are disclosed, hi one embodiment, the method includes providing a parallel imaging writer system which has a plurality of spatial light modulator (SLM) imaging units arranged in one or more parallel arrays, receiving a mask data pattern to be written to a substrate, processing the mask data pattern to form a plurality of partitioned mask data patterns corresponding to different areas of the substrate, identifying an overlapping region between adjacent imaging areas to be imaged by corresponding SLMs, determining a stitching path for merging the adjacent imaging areas m the overlapping region in accordance with a set of predetermined cost functions, and controlling the plurality of SLM imaging units to write die plurality of partitioned mask data patterns to the substrate in parallel using the stitching path.

Abstract translation: 公开了一种用于在光刻制造过程中在相邻成像区域之间处理图像数据的系统和方法。在一个实施例中，该方法包括提供并行成像写入器系统，其具有布置在一个或多个中的多个空间光调制器（SLM）成像单元 平行阵列，接收要写入衬底的掩模数据模式，处理掩模数据模式以形成对应于衬底的不同区域的多个划分的掩模数据模式，通过相应的识别要成像的相邻成像区域之间的重叠区域 SLM，确定用于根据一组预定的成本函数合并重叠区域中的相邻成像区域的缝合路径，以及控制多个SLM成像单元将多个分割的掩模数据图案写入到基板上，并使用 拼接路径