Invention Application
WO2011092020A3 ARRANGEMENT FOR USE IN A PROJECTION EXPOSURE TOOL FOR MICROLITHOGRAPHY HAVING A REFLECTIVE OPTICAL ELEMENT
审中-公开
用于具有反射光学元件的微型摄影用投影曝光工具中的安排
- Patent Title: ARRANGEMENT FOR USE IN A PROJECTION EXPOSURE TOOL FOR MICROLITHOGRAPHY HAVING A REFLECTIVE OPTICAL ELEMENT
- Patent Title (中): 用于具有反射光学元件的微型摄影用投影曝光工具中的安排
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Application No.: PCT/EP2011000385Application Date: 2011-01-28
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Publication No.: WO2011092020A3Publication Date: 2011-09-29
- Inventor: EHM DIRK HEINRICH , VAN KAMPEN MAARTEN , SCHMIDT STEFAN-WOLFGANG , BANINE VADIM YEVGENYEVICH , LOOPSTRA ERIK
- Applicant: ZEISS CARL SMT GMBH , ASML NETHERLANDS BV , EHM DIRK HEINRICH , VAN KAMPEN MAARTEN , SCHMIDT STEFAN-WOLFGANG , BANINE VADIM YEVGENYEVICH , LOOPSTRA ERIK
- Assignee: ZEISS CARL SMT GMBH,ASML NETHERLANDS BV,EHM DIRK HEINRICH,VAN KAMPEN MAARTEN,SCHMIDT STEFAN-WOLFGANG,BANINE VADIM YEVGENYEVICH,LOOPSTRA ERIK
- Current Assignee: ZEISS CARL SMT GMBH,ASML NETHERLANDS BV,EHM DIRK HEINRICH,VAN KAMPEN MAARTEN,SCHMIDT STEFAN-WOLFGANG,BANINE VADIM YEVGENYEVICH,LOOPSTRA ERIK
- Priority: DE102010006326 2010-01-29
- Main IPC: G01J1/04
- IPC: G01J1/04 ; G03F7/20
Abstract:
An arrangement for use in a projection exposure tool (100) for microlithography comprises a reflective optical element (10; 110) and a radiation detector (30; 32; 130). The reflective optical element (10; 110) comprises a carrier element (12) guaranteeing the mechanical strength of the optical element (10; 110) and a reflective coating (18) disposed on the carrier element (12) for reflecting a use radiation (20a). The carrier element (12) is made of a material which upon interaction with the use radiation (20a) emits a secondary radiation (24) the wavelength of which differs from the wavelength of the use radiation (20a), and the radiation detector (30; 32; 130) is configured to detect the secondary radiation (24).
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