公开(公告)号：WO2015124457A1

公开(公告)日：2015-08-27

申请号：PCT/EP2015052673

申请日：2015-02-10

Applicant: ASML NETHERLANDS BV ,  ZEISS CARL SMT GMBH

Inventor： VAN SCHOOT JAN BERNARD PLECHELMUS ,  MIGURA SASCHA ,  KNEER BERNHARD

IPC: G03F7/20

CPC classification number: G03F7/70358 ,  G03F1/00 ,  G03F7/70033 ,  G03F7/70233 ,  G03F7/70433

Abstract: A lithographic apparatus comprising a support structure constructed to support a mask comprising a patterned area which is capable of imparting an EUV radiation beam with a pattern in its cross-section to form a patterned radiation beam, wherein the support structure is movable in a scanning direction, a substrate table constructed to hold a substrate, wherein the substrate table is movable in the scanning direction, and a projection system configured to project the patterned radiation beam onto an exposure region of the substrate, wherein the projection system has a demagnification in the scanning direction which is greater than a demagnification in a second direction which is perpendicular to the scanning direction and wherein the demagnification in the second direction is greater than 4x.

Abstract translation: 一种光刻设备，包括支撑结构，该支撑结构构造成支撑掩模，该掩模包括图案化区域，该图案区域能够在其横截面中赋予EUV辐射束图案以形成图案化的辐射束，其中所述支撑结构可沿扫描方向移动 构造成保持衬底的衬底台，其中所述衬底台可沿扫描方向移动;以及投影系统，被配置为将所述图案化的辐射束投影到所述衬底的曝光区域上，其中所述投影系统具有扫描的缩小 方向大于垂直于扫描方向的第二方向的缩小，并且其中第二方向上的缩小大于4x。

公开(公告)号：WO2015091920A3

公开(公告)日：2015-08-13

申请号：PCT/EP2014078678

申请日：2014-12-19

Applicant: ZEISS CARL SMT GMBH

Inventor： SCHULTE STEFAN ,  SCHILLKE FRANK

IPC: G01B9/02 ,  G01B9/021 ,  G01M11/02

CPC classification number: G01B9/02039 ,  G01B9/02085 ,  G01B9/021 ,  G01M11/005 ,  G03F7/7015

Abstract: Method for measuring a spherical-astigmatic optical area (40), comprising the steps of: a) generating a spherical-astigmatic wavefront as a test wavefront by means of a wavefront generating apparatus (10); b) interferometrically measuring wavefront aberrations between the wavefront generating apparatus (10) and the spherical-astigmatic area (40) which is adjusted to the wavefront generating apparatus (40) in such a way that the test wavefront impinges any point in the spherical-astigmatic area (40) substantially in a vertical direction, a plurality of measurements being taken in which the spherical-astigmatic area (40) is measured in a number of positions, spherized about the two centers of the radii of the astigmatism and/or rotated by 180° about a surface normal to the spherical-astigmatic area (40), such that corresponding interferogram phases are determined; and c) determining the wavefront of the wavefront generating apparatus (10) and of a shape of the spherical-astigmatic area (40) by means of a mathematical reconstructive method, whereupon the surface of the spherical-astigmatic area (40) is corrected using a suitable processing method, steps a) to c) being repeated until the wavefront aberrations are smaller than a defined threshold value.

Abstract translation: 一种用于测量球面象散光学表面（40），其包括以下步骤的方法：a）生成一个球形散光波前通过波阵面发生装置的测试波阵面（10）; b）中的波阵面发生装置之间的波阵面差异干涉测量（10）和（在波阵面生成单元10），从而适于球形散光表面（40），所述测试波阵面基本上垂直地入射在球形散光表面的任何点（40），其中 多次测量被执行，其中，在多个周围加捻两个散光半径中心点和/或180°verkugelt位置的球面象散表面（40）是由正常的球面像散表面（40），其中，相应的Interferogrammphasen来确定的表面测量的; 和c）确定所述波阵面生成装置的波阵面（10）和球形散光表面（40）由数学重建方法的装置的表面形状，根据该球面散光表面（40）的表面通过适当的加工方法的装置校正，其中，所述步骤a） 被重复以c），直到所述波前的差异低于定义的阈值。

公开(公告)号：WO2014128010A8

公开(公告)日：2015-04-09

申请号：PCT/EP2014052405

申请日：2014-02-07

Applicant: ZEISS CARL SMT GMBH

Inventor： SÄNGER INGO

IPC: G03F7/20 ,  G02B5/30 ,  G02B27/09 ,  G02B27/28 ,  G21K1/06

CPC classification number: G02B5/3083 ,  G02B5/0891 ,  G02B5/3091 ,  G02B27/0977 ,  G02B27/286 ,  G03F7/70058 ,  G03F7/70091 ,  G03F7/70191 ,  G03F7/70308 ,  G03F7/70425 ,  G03F7/70566 ,  G21K1/062 ,  H05G2/001

Abstract: An EUV light source (2) serves for generating a used output beam (3) of EUV illumination light for a projection exposure apparatus for projection lithography. The light source (2) has an EUV generation device (2c), which generates an EUV raw output beam (30). The raw output beam (30) has a circular or elliptic polarization (31). A used polarization setting device (32) of the light source (2), for the purpose of setting the polarization of the used output beam (3), exerts on the raw output beam (30) an effect (34) which is linearly polarizing with regard to the direction of polarization. The used polarization setting device (32) has at least one phase retarding component (37) which is arranged in the beam path of the raw output beam (30). Said at least one phase retarding component generates a net phase shift between the two linearly polarized waves which are superimposed to form the polarization of the raw output beam (30), which net phase shift is less than half a wavelength λ of the used output beam (3) of the EUV illumination light. The result is an EUV light source having an improved output beam for resolution-optimized illumination.

Abstract translation: EUV光源（2）用于产生用于投影光刻的投影曝光装置的EUV照明光的使用的输出光束（3）。 光源（2）具有EUV生成装置（2c），其生成EUV原始输出光束（30）。 原始输出光束（30）具有圆形或椭圆偏振（31）。 为了设定所使用的输出光束（3）的偏振的目的，光源（2）的所使用的偏振设置装置（32）在原始输出光束（30）上施加线性偏振的效果（34） 关于极化的方向。 所使用的偏振光设定装置（32）具有配置在原始输出光束（30）的光束路径中的至少一个相位延迟部件（37）。 所述至少一个相位延迟分量产生两个线偏振波之间的净相移，这两个线性偏振波被叠加以形成原始输出光束（30）的偏振，该净相位小于所使用的输出光束的一半波长λ （3）的EUV照明灯。 结果是具有用于分辨率优化照明的改进的输出光束的EUV光源。

公开(公告)号：WO2014139896A3

公开(公告)日：2014-11-06

申请号：PCT/EP2014054487

申请日：2014-03-07

Applicant: ZEISS CARL SMT GMBH ,  HAUF MARKUS

Inventor： HAUF MARKUS

IPC: G03F7/20

CPC classification number: G03F7/70891 ,  G02B7/181 ,  G02B26/0825 ,  G03F7/70266 ,  G03F7/70883

Abstract: The invention concerns an arrangement for the thermal actuation of a mirror, in particular in a microlithographic projection exposure apparatus, the mirror having a mirror substrate (102, 202) and an optically effective surface (101, 201) and also at least one access channel (110, 111, 112, 210) extending from a surface of the mirror (100) not corresponding to the optically effective surface in the direction of this effective surface (101, 201),wherein a cooling element (120, 220)with a cooling power that can be set variably protrudes into the at least one access channel (110, 111, 112, 210), and wherein at least one heat source for coupling heating power that can be set variably into the region of the mirror substrate (102, 202) that is adjoining the optically effective surface is provided;wherein by setting the cooling power of the cooling element (120, 220)and the heating power of the at least one heat source, a thermal flux between the optically effective surface (101, 201) and said surface of the mirror (100) not corresponding to the optically effective surface is achievable, said thermal flux resulting in a temperature gradient and a related local variation of a value of the coefficient of thermal expansion in the mirror substrate (102, 202).

Abstract translation: 本发明涉及用于反射镜的热致动的装置，特别是在微光刻投影曝光装置中，反射镜具有镜面基板（102,202）和光学有效表面（101,201）以及至少一个接近通道 （101,111,212,210），其从所述反射镜（100）的不对应于所述有效表面（101,201）的所述光学有效表面的表面延伸，其中，具有 可设置的冷却功率可变地突出到至少一个进入通道（110,111,112,210）中，并且其中至少一个用于耦合加热功率的热源可以可变地设置到镜面基板（102 ，202），其设置在所述光学有效表面上;其中，通过设定所述冷却元件（120,220）的冷却功率和所述至少一个热源的加热功率，在所述光学有效表面（101 ，201）和sai 可以实现不对应于光学有效表面的反射镜（100）的表面，所述热通量导致反射镜基板（102,202）中的温度梯度和热膨胀系数值的相关局部变化。

公开(公告)号：WO2014128010A3

公开(公告)日：2014-10-16

申请号：PCT/EP2014052405

申请日：2014-02-07

Applicant: ZEISS CARL SMT GMBH

Inventor： SÄNGER INGO

IPC: G03F7/20 ,  G02B5/30 ,  G02B27/09 ,  G02B27/28 ,  G21K1/06

CPC classification number: G02B5/3083 ,  G02B5/0891 ,  G02B5/3091 ,  G02B27/0977 ,  G02B27/286 ,  G03F7/70058 ,  G03F7/70091 ,  G03F7/70191 ,  G03F7/70308 ,  G03F7/70425 ,  G03F7/70566 ,  G21K1/062 ,  H05G2/001

Abstract: An EUV light source (2) serves for generating a used output beam (3) of EUV illumination light for a projection exposure apparatus for projection lithography. The light source (2) has an EUV generation device (2c), which generates an EUV raw output beam (30). The raw output beam (30) has a circular or elliptic polarization (31). A used polarization setting device (32) of the light source (2), for the purpose of setting the polarization of the used output beam (3), exerts on the raw output beam (30) an effect (34) which is linearly polarizing with regard to the direction of polarization. The used polarization setting device (32) has at least one phase retarding component (37) which is arranged in the beam path of the raw output beam (30). Said at least one phase retarding component generates a net phase shift between the two linearly polarized waves which are superimposed to form the polarization of the raw output beam (30), which net phase shift is less than half a wavelength λ of the used output beam (3) of the EUV illumination light. The result is an EUV light source having an improved output beam for resolution-optimized illumination.

Abstract translation: EUV光源（2）用于产生用于投影光刻的投影曝光装置的EUV照明光的用过的输出光束（3）。 光源（2）具有生成EUV原始输出光束（30）的EUV生成装置（2c）。 原始输出光束（30）具有圆形或椭圆偏振（31）。 为了设定所使用的输出光束（3）的偏振，光源（2）的使用的偏振设置装置（32）在原始输出光束（30）上施加线偏振的效应（34） 关于极化的方向。 所使用的偏振设置装置（32）具有至少一个布置在原始输出光束（30）的光束路径中的相位延迟部件（37）。 所述至少一个相位延迟部件在叠加以形成原始输出光束（30）的偏振的两个线性偏振波之间产生净相移，该净相移小于所使用的输出光束的波长λ的一半 （3）的EUV照明光。 其结果是具有用于分辨率优化照明的改进的输出光束的EUV光源。

公开(公告)号：WO2014012660A2

公开(公告)日：2014-01-23

申请号：PCT/EP2013002111

申请日：2013-07-16

Applicant: ZEISS CARL SMT GMBH

Inventor： BITTNER BORIS ,  WABRA NORBERT ,  SCHNEIDER SONJA ,  SCHNEIDER RICARDA ,  WAGNER HENDRIK ,  ILIEW RUMEN

IPC: G03F7/20

CPC classification number: G03F7/70266 ,  G03F7/70508 ,  G03F7/70525 ,  G03F7/706 ,  G03F7/70975

Abstract: A microlithographic projection exposure apparatus (10) configured in particular for EUV light includes a projection objective (26) having an adaptive mirror (M2) comprising, for its part, a mirror substrate (44) and an actuation unit (42) for deforming the mirror substrate (44). Using imaging aberrations measured previously, a set of control commands for the actuation unit (42) is determined, and when said set of control commands is transferred to the actuation unit (42), the mirror substrate (44) is deformed such that the imaging aberrations measured previously are corrected. Said set of control commands is stored in a nonvolatile data memory (66) and transferred to the actuation unit (42). If the operation of the projection exposure apparatus is interrupted after relatively long operating durations, the correction state previously present can be rapidly reestablished by simply reloading the stored control commands, without a renewed measurement of the imaging aberrations of the projection objective (26) being required.

Abstract translation: 特别用于EUV光的微光刻投影曝光装置（10）包括具有自适应反射镜（M2）的投影物镜（26），该自适应反射镜（M2）部分包括反射镜基板（44）和致动单元（42），用于使 镜基底（44）。 使用先前测量的成像像差，确定用于致动单元（42）的一组控制命令，并且当所述一组控制命令被传送到致动单元（42）时，镜基板（44）变形，使得成像 以前测量的像差被校正。 所述一组控制命令被存储在非易失性数据存储器（66）中并传送到致动单元（42）。 如果投影曝光装置的操作在相对长的操作持续时间之后中断，则可以通过简单地重新加载所存储的控制命令来快速重建先前存在的校正状态，而不需要对投影物镜（26）的成像像差进行更新测量 。

公开(公告)号：WO2014012641A2

公开(公告)日：2014-01-23

申请号：PCT/EP2013002074

申请日：2013-07-12

Applicant: ZEISS CARL SMT GMBH

Inventor： WOLF ALEXANDER ,  SCHWAB MARKUS ,  GRUNER TORALF ,  HARTJES JOACHIM

IPC: G01B9/02

CPC classification number: G01B11/14 ,  G03F7/70775 ,  G03F7/7085 ,  H01J37/317 ,  H01J2237/0203 ,  H01J2237/31777 ,  H05G2/008

Abstract: A projection exposure apparatus (10) for microlithography comprises a plurality of optical components (M1-M6) forming an exposure beam path, and comprises a distance measurement system (30, 130, 230) for measuring a distance between at least one of the optical components (M1-M6) and a reference element (40, 140, 240). The distance measurement system comprises a frequency comb generator (32, 132, 232), which is configured for generating electromagnetic radiation (36, 236) with a comb-shaped frequency spectrum.

Abstract translation: 一种用于微光刻的投影曝光设备（10），包括形成曝光光束路径的多个光学部件（M1-M6），并且包括用于测量光学元件中的至少一个之间的距离的距离测量系统（30,130,230） 组件（M1-M6）和参考元件（40,140,​​240）。 该距离测量系统包括频率梳生成器（32,132,232），其被配置为用于生成具有梳状频谱的电磁辐射（36,236）。

公开(公告)号：WO2013120839A3

公开(公告)日：2013-12-27

申请号：PCT/EP2013052763

申请日：2013-02-12

Applicant: ZEISS CARL SMT GMBH

Inventor： STOLZ MICHAEL ,  GERBER PETER ,  HEMBACHER STEFAN

IPC: G03F7/20

CPC classification number: G03F7/70941 ,  G02B7/1828 ,  G03F7/70825

Abstract: A device (26) for the magnetic-field-compensated positioning of a component (25, 30) comprises a holding unit (27) for mounting the component (25, 30) and means (33) for at least partly compensating for an external magnetic field in the region of the holding unit (27).

Abstract translation: 用于部件（25,30）的磁场补偿定位的装置（26）包括用于安装部件（25,30）的保持单元（27）和用于至少部分补偿外部的装置（33） 在保持单元（27）的区域中的磁场。

公开(公告)号：WO2012126621A3

公开(公告)日：2012-11-15

申请号：PCT/EP2012001249

申请日：2012-03-21

Applicant: ZEISS CARL SMT GMBH ,  LAUFER TIMO

Inventor： LAUFER TIMO

IPC: G01D11/30 ,  G02B7/00 ,  G03F7/20

CPC classification number: G01N25/16 ,  G03F7/70825 ,  G03F7/7085 ,  G03F7/70858

Abstract: A lithography apparatus comprises a structural element, a sensor (220) having a detection region (225) for detecting a physical quantity in at least one detection direction with respect to the structural element, and a sensor receptacle (210) for mounting the sensor (220) to the structural element, wherein the sensor (220) is arranged in such a way that the maximum displacement of the detection region (225, 255) in the detection direction relative to the structural element (140) is not greater than the maximum displacement of the detection region (225, 255) in the detection direction in the case of an arrangement of the sensor (220, 250) orthogonally with respect thereto.

Abstract translation: 光刻设备包括结构元件，具有检测区域（225）的传感器（220），用于检测关于结构元件的至少一个检测方向上的物理量;以及传感器插座（210），用于安装传感器 220），其中所述传感器（220）被布置成使得所述检测区域（225,255）在所述检测方向上相对于所述结构元件（140）的最大位移不大于所述结构元件 在传感器（220,250）的布置的情况下，检测区域（225,255）在检测方向上的位移正交。

公开(公告)号：WO2012112894A3

公开(公告)日：2012-11-08

申请号：PCT/US2012025656

申请日：2012-02-17

Applicant: APPLIED MATERIALS ISRAEL LTD ,  APPLIED MATERIALS INC ,  ZEISS CARL SMT GMBH ,  RODGERS STEVEN R ,  KNIPPELMEYER RAINER K ,  KEMEN THOMAS ,  SCHUBERT STEFAN ,  ELMALIAH NISSIM

Inventor： RODGERS STEVEN R ,  KNIPPELMEYER RAINER K ,  KEMEN THOMAS ,  SCHUBERT STEFAN ,  ELMALIAH NISSIM

IPC: H01J37/09 ,  H01J37/21 ,  H01J37/22 ,  H01J37/28

CPC classification number: H01J37/21 ,  H01J37/06 ,  H01J37/09 ,  H01J37/153 ,  H01J37/22 ,  H01J37/222 ,  H01J37/244 ,  H01J37/261 ,  H01J37/28 ,  H01J37/29 ,  H01J2237/0453 ,  H01J2237/049 ,  H01J2237/063 ,  H01J2237/1532 ,  H01J2237/21 ,  H01J2237/2817

Abstract: A charged particle beam focusing apparatus (200) includes a charged particle beam generator (202) configured to project simultaneously at least one non-astigmatic charged particle beam and at least one astigmatic charged particle beam onto locations (217) on a surface of a specimen (39), thereby causing released electrons to be emitted from the locations. The apparatus also includes an imaging detector (31) configured to receive the released electrons from the locations and to form images of the locations from the released electrons. A processor (32) analyzes the image produced by the at least one astigmatic charged particle beam and in response thereto adjusts a focus of the at least one non-astigmatic charged particle beam.

Abstract translation: 带电粒子束聚焦装置（200）包括带电粒子束发生器（202），其被配置为同时投射至少一个非散光带电粒子束和至少一个散光带电粒子束到样品表面上的位置（217） （39），从而使得释放的电子从该位置发射。 该装置还包括成像检测器（31），其被配置为从该位置接收释放的电子并且从释放的电子形成位置的图像。 处理器（32）分析由至少一个散光带电粒子束产生的图像，并响应于此调整至少一个非散光带电粒子束的焦点。