Invention Application
- Patent Title: METHOD FOR SINTERING A SEMICONDUCTOR DEVICE USING A LOW-TEMPERATURE JOINING TECHNIQUE
- Patent Title (中): 用于NTV烧结半导体组件的方法
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Application No.: PCT/DE2011000231Application Date: 2011-03-02
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Publication No.: WO2011113414A4Publication Date: 2012-05-03
- Inventor: KOCK MATHIAS
- Applicant: DANFOSS SILICON POWER GMBH , KOCK MATHIAS
- Assignee: DANFOSS SILICON POWER GMBH,KOCK MATHIAS
- Current Assignee: DANFOSS SILICON POWER GMBH,KOCK MATHIAS
- Priority: DE102010012231 2010-03-19
- Main IPC: H01L21/48
- IPC: H01L21/48 ; H01L21/60
Abstract:
The invention relates to a method for sintering a semiconductor component (5), which is suitable for power electronics and provided with contact areas, using a low-temperature joining technique. A sintering layer (6) that dissipates heat is arranged under the semiconductor component. The semiconductor component is provided with a further electrically and thermally conductive flat layer (4), to which bonding wires or bonding strips (1a, 1b) are bonded. In the method, the at least one further layer (4) is applied to the contact areas beyond insulating projecting edges (3), and sintering dies act on the applied at least one further layer (4) during sintering.
Public/Granted literature
- WO2011113414A2 METHOD FOR SINTERING A SEMICONDUCTOR DEVICE USING A LOW-TEMPERATURE JOINING TECHNIQUE Public/Granted day:2011-09-22
Information query
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