Invention Application
- Patent Title: METHOD AND SYSTEM FOR THERMAL IMPRINT LITHOGRAPHY
-
Application No.: PCT/US2011/044523Application Date: 2011-07-19
-
Publication No.: WO2012015634A3Publication Date: 2012-02-02
- Inventor: KUO, David , HWU, Justin , GAUZNER, Gennady , LEE, Kim, Yang , WELLER, Dieter
- Applicant: SEAGATE TECHNOLOGY LLC , KUO, David , HWU, Justin , GAUZNER, Gennady , LEE, Kim, Yang , WELLER, Dieter
- Applicant Address: 10200 South De Anza Blvd. Cupertino, CA 95014 US
- Assignee: SEAGATE TECHNOLOGY LLC,KUO, David,HWU, Justin,GAUZNER, Gennady,LEE, Kim, Yang,WELLER, Dieter
- Current Assignee: SEAGATE TECHNOLOGY LLC,KUO, David,HWU, Justin,GAUZNER, Gennady,LEE, Kim, Yang,WELLER, Dieter
- Current Assignee Address: 10200 South De Anza Blvd. Cupertino, CA 95014 US
- Agency: ZAHRT, Justin, W.
- Priority: US12/847,964 20100730
- Main IPC: B29C59/02
- IPC: B29C59/02 ; B29C33/38
Abstract:
A method and apparatus of thermal imprint lithography includes moving an imprinter against a surface to be imprinted, supplying energy to a layer of heating material, and forming features in the surface to be imprinted. The imprinter comprises a main body and the layer of heating material under the main body. In an embodiment the layer of heating material is electrically heated. In alternate embodiments, the layer of heating material is optically heated.
Information query
