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    METHOD AND SYSTEM FOR THERMAL IMPRINT LITHOGRAPHY
    2.
    发明申请
    METHOD AND SYSTEM FOR THERMAL IMPRINT LITHOGRAPHY 审中-公开
    用于热印迹光刻的方法和系统

    公开(公告)号：WO2012015634A2

    公开(公告)日：2012-02-02

    申请号：PCT/US2011044523

    申请日：2011-07-19

    Applicant: SEAGATE TECHNOLOGY LLC ,  KUO DAVID ,  HWU JUSTIN ,  GAUZNER GENNADY ,  LEE KIM YANG ,  WELLER DIETER

    Inventor： KUO DAVID ,  HWU JUSTIN ,  GAUZNER GENNADY ,  LEE KIM YANG ,  WELLER DIETER

    IPC: B29C59/02 ,  B29C33/38

    CPC classification number: G03F7/0002 ,  B82Y10/00 ,  B82Y40/00

    Abstract: A method and apparatus of thermal imprint lithography includes moving an imprinter against a surface to be imprinted, supplying energy to a layer of heating material, and forming features in the surface to be imprinted. The imprinter comprises a main body and the layer of heating material under the main body. In an embodiment the layer of heating material is electrically heated. In alternate embodiments, the layer of heating material is optically heated.

    Abstract translation: 热压印光刻的方法和设备包括将压印器移动到要被压印的表面，将能量供应到加热材料层，并且在要压印的表面中形成特征。 压印机包括主体和位于主体下面的加热材料层。 在一个实施例中，加热材料层被电加热。 在替代实施例中，加热材料层被光学加热。

    NANO-SCALE VOID REDUCTION
    3.
    发明申请
    NANO-SCALE VOID REDUCTION 审中-公开
    纳米级减少空洞

    公开(公告)号：WO2013192018A3

    公开(公告)日：2014-05-15

    申请号：PCT/US2013045747

    申请日：2013-06-13

    Applicant: SEAGATE TECHNOLOGY LLC ,  HWU JUSTIN JIA-JEN ,  GAUZNER GENNADY ,  GREENBERG THOMAS LARSON

    Inventor： HWU JUSTIN JIA-JEN ,  GAUZNER GENNADY ,  GREENBERG THOMAS LARSON

    IPC: B29C59/02 ,  B82B3/00

    CPC classification number: G03F7/0002

    Abstract: Resist imprinting void reduction method may include sealing a chamber. The chamber may be filled with an ambient inert gas, wherein the inert gas a solubility in a resist layer on a substrate greater than Helium. The method may also include establishing a pressure within the chamber sufficient to cause absorption of the ambient inert gas by the resist layer, and sufficient to suppress evaporation of the resist layer.

    Abstract translation: 抗印刻空隙减少方法可以包括密封室。 腔室可以充满环境惰性气体，其中惰性气体在基板上的抗蚀剂层中的溶解度高于氦气。 该方法还可以包括在腔室内建立足以引起抗蚀剂层对环境惰性气体的吸收并且足以抑制抗蚀剂层的蒸发的压力。

    NANO-SCALE VOID REDUCTION
    5.
    发明申请
    NANO-SCALE VOID REDUCTION 审中-公开
    NANO-SCALE VOID减少

    公开(公告)号：WO2013192018A2

    公开(公告)日：2013-12-27

    申请号：PCT/US2013045747

    申请日：2013-06-13

    Applicant: SEAGATE TECHNOLOGY LLC ,  HWU JUSTIN JIA-JEN ,  GAUZNER GENNADY ,  GREENBERG THOMAS LARSON

    Inventor： HWU JUSTIN JIA-JEN ,  GAUZNER GENNADY ,  GREENBERG THOMAS LARSON

    CPC classification number: G03F7/0002

    Abstract: Resist imprinting void reduction method may include sealing a chamber. The chamber may be filled with an ambient inert gas, wherein the inert gas a solubility in a resist layer on a substrate greater than Helium. The method may also include establishing a pressure within the chamber sufficient to cause absorption of the ambient inert gas by the resist layer, and sufficient to suppress evaporation of the resist layer.

    Abstract translation: 抗蚀刻印痕空隙缩小法可包括密封腔室。 室可以填充有环境惰性气体，其中惰性气体在基底上的抗蚀剂层中的溶解度大于氦。 该方法还可以包括在室内建立足以使抗蚀剂层吸收环境惰性气体并足以抑制抗蚀剂层蒸发的压力。

    CALIBRATION STANDARD WITH PRE-DETERMINED FEATURES
    7.
    发明申请
    CALIBRATION STANDARD WITH PRE-DETERMINED FEATURES 审中-公开
    具有预先确定的特征的校准标准

    公开(公告)号：WO2014171929A1

    公开(公告)日：2014-10-23

    申请号：PCT/US2013/036876

    申请日：2013-04-17

    Applicant: SEAGATE TECHNOLOGY LLC ,  GAUZNER, Gennady ,  YU, Zhaoning ,  KURATAKA, Nobuo ,  KUO, David S. ,  LEE, Kim Y. ,  HSU, Yautzong ,  WANG, HongYing

    Inventor： GAUZNER, Gennady ,  YU, Zhaoning ,  KURATAKA, Nobuo ,  KUO, David S. ,  LEE, Kim Y. ,  HSU, Yautzong ,  WANG, HongYing

    IPC: H01L21/66 ,  H01L21/02

    CPC classification number: G01Q40/02 ,  G01N21/01 ,  G01N2201/13 ,  G01Q40/00 ,  G03F7/0002 ,  H01J37/261 ,  H01J37/263 ,  H01J2237/2602 ,  H01J2237/2826

    Abstract: Provided herein in an apparatus, including a substrate; a functional layer, wherein the functional layer has a composition characteristic of a workpiece of an analytical apparatus; and pre-determined features configured to calibrate the analytical apparatus. Also provided herein is an apparatus, including a functional layer overlying a substrate; and pre-determined features for calibration of an analytical apparatus configured to measure the surface of a workpiece, wherein the functional layer has a composition similar to the workpiece. Also provided herein is a method, including providing a lithographic calibration standard having a functional layer to an analytical apparatus, wherein the functional layer has a composition characteristic of a workpiece of the analytical apparatus; providing calibration standard specifications to a computer interfaced with the analytical apparatus; and calibrating the analytical apparatus in accordance with calibration standard readings and the calibration standard specifications.

    Abstract translation: 本文提供的装置包括基板; 功能层，其中所述功能层具有分析装置的工件的成分特征; 以及配置成校准分析装置的预定特征。 本文还提供了一种装置，包括覆盖衬底的功能层; 以及用于校准配置成测量工件表面的分析装置的预定特征，其中所述功能层具有类似于所述工件的组成。 本文还提供了一种方法，包括向分析装置提供具有功能层的光刻校准标准，其中功能层具有分析装置的工件的成分特征; 向与分析仪器连接的计算机提供校准标准规格; 并根据校准标准读数和校准标准规格校准分析仪器。

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