Invention Application
- Patent Title: REAL-TIME MONITORING OF RETAINING RING THICKNESS AND LIFETIME
- Patent Title (中): 保持环厚度和寿命的实时监测
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Application No.: PCT/US2011/036731Application Date: 2011-05-17
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Publication No.: WO2012018425A2Publication Date: 2012-02-09
- Inventor: MCREYNOLDS, Peter , RONDUM, Eric S. , LEUNG, Garlen C. , ZHONG, Adam H. , MENK, Gregory E. , PRABHU, Gopalakrishna B. , OSTERHELD, Thomas H.
- Applicant: APPLIED MATERIALS, INC. , MCREYNOLDS, Peter , RONDUM, Eric S. , LEUNG, Garlen C. , ZHONG, Adam H. , MENK, Gregory E. , PRABHU, Gopalakrishna B. , OSTERHELD, Thomas H.
- Applicant Address: 3050 Bowers Avenue Santa Clara, California 95054 US
- Assignee: APPLIED MATERIALS, INC.,MCREYNOLDS, Peter,RONDUM, Eric S.,LEUNG, Garlen C.,ZHONG, Adam H.,MENK, Gregory E.,PRABHU, Gopalakrishna B.,OSTERHELD, Thomas H.
- Current Assignee: APPLIED MATERIALS, INC.,MCREYNOLDS, Peter,RONDUM, Eric S.,LEUNG, Garlen C.,ZHONG, Adam H.,MENK, Gregory E.,PRABHU, Gopalakrishna B.,OSTERHELD, Thomas H.
- Current Assignee Address: 3050 Bowers Avenue Santa Clara, California 95054 US
- Agency: PATTERSON, B. Todd et al.
- Priority: US12/843,793 20100726
- Main IPC: H01L21/304
- IPC: H01L21/304 ; H01L21/66
Abstract:
A method and apparatus for monitoring the condition of a surface of a retaining ring disposed on a carrier head in a polishing module is described. In one embodiment, an apparatus is provided. The apparatus includes a carrier head movable in a travel path between at least one polishing station for polishing a substrate as the substrate is retained in the carrier head, and a transfer station for transferring the substrate to and from the carrier head, the carrier head having a retaining ring, and a sensor disposed in the travel path of the carrier head, the sensor operable to provide a metric indicative of a condition of the retaining ring.
Information query
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