公开(公告)号：WO2012018425A3

公开(公告)日：2012-05-18

申请号：PCT/US2011036731

申请日：2011-05-17

Applicant: APPLIED MATERIALS INC ,  MCREYNOLDS PETER ,  RONDUM ERIC S ,  LEUNG GARLEN C ,  ZHONG ADAM H ,  MENK GREGORY E ,  PRABHU GOPALAKRISHNA B ,  OSTERHELD THOMAS H

Inventor： MCREYNOLDS PETER ,  RONDUM ERIC S ,  LEUNG GARLEN C ,  ZHONG ADAM H ,  MENK GREGORY E ,  PRABHU GOPALAKRISHNA B ,  OSTERHELD THOMAS H

IPC: H01L21/304 ,  H01L21/66

CPC classification number: B24B37/005 ,  B24B37/042 ,  B24B37/32

Abstract: A method and apparatus for monitoring the condition of a surface of a retaining ring disposed on a carrier head in a polishing module is described. In one embodiment, an apparatus is provided. The apparatus includes a carrier head movable in a travel path between at least one polishing station for polishing a substrate as the substrate is retained in the carrier head, and a transfer station for transferring the substrate to and from the carrier head, the carrier head having a retaining ring, and a sensor disposed in the travel path of the carrier head, the sensor operable to provide a metric indicative of a condition of the retaining ring.

Abstract translation: 描述了一种用于监测设置在抛光模块中的载体头上的保持环的表面的状态的方法和设备。 在一个实施例中，提供了一种装置。 该装置包括一个载体头，该载体头在至少一个抛光站之间的移动路径中可移动，用于当基底保持在载体头中时抛光基底;以及传送站，用于将基底传送到载体头和从载体头传送，载体头具有 保持环和布置在承载头的行进路径中的传感器，传感器可操作以提供指示保持环状态的度量。

公开(公告)号：WO2012018425A2

公开(公告)日：2012-02-09

申请号：PCT/US2011/036731

申请日：2011-05-17

Applicant: APPLIED MATERIALS, INC. ,  MCREYNOLDS, Peter ,  RONDUM, Eric S. ,  LEUNG, Garlen C. ,  ZHONG, Adam H. ,  MENK, Gregory E. ,  PRABHU, Gopalakrishna B. ,  OSTERHELD, Thomas H.

Inventor： MCREYNOLDS, Peter ,  RONDUM, Eric S. ,  LEUNG, Garlen C. ,  ZHONG, Adam H. ,  MENK, Gregory E. ,  PRABHU, Gopalakrishna B. ,  OSTERHELD, Thomas H.

IPC: H01L21/304 ,  H01L21/66

CPC classification number: B24B37/005 ,  B24B37/042 ,  B24B37/32

Abstract: A method and apparatus for monitoring the condition of a surface of a retaining ring disposed on a carrier head in a polishing module is described. In one embodiment, an apparatus is provided. The apparatus includes a carrier head movable in a travel path between at least one polishing station for polishing a substrate as the substrate is retained in the carrier head, and a transfer station for transferring the substrate to and from the carrier head, the carrier head having a retaining ring, and a sensor disposed in the travel path of the carrier head, the sensor operable to provide a metric indicative of a condition of the retaining ring.

Abstract translation: 描述了一种用于监测设置在抛光模块中的载体头上的保持环的表面状况的方法和装置。 在一个实施例中，提供了一种装置。 该装置包括：承载头，其可在基板被保持在承载头中的用于抛光基板的至少一个抛光站之间的行进路径中移动;以及传送站，用于将基板传送到承载头和从载体头传送，承载头具有 保持环和设置在所述承载头的行进路径中的传感器，所述传感器可操作以提供指示所述保持环的状态的度量。