Invention Application
WO2012032063A1 METHODS AND APPARATUS FOR PATTERNING PHOTOVOLTAIC DEVICES AND MATERIALS FOR USE WITH SUCH DEVICES
审中-公开
用于绘制光伏器件的方法和装置以及与这些器件一起使用的材料
- Patent Title: METHODS AND APPARATUS FOR PATTERNING PHOTOVOLTAIC DEVICES AND MATERIALS FOR USE WITH SUCH DEVICES
- Patent Title (中): 用于绘制光伏器件的方法和装置以及与这些器件一起使用的材料
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Application No.: PCT/EP2011/065414Application Date: 2011-09-06
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Publication No.: WO2012032063A1Publication Date: 2012-03-15
- Inventor: BAIRD, Brian W , GERKE, Timothy D
- Applicant: FIANIUM LIMITED , BAIRD, Brian W , GERKE, Timothy D
- Applicant Address: 20 Compass Point Ensign Way Hamble Southampton Hampshire SO31 4RA GB
- Assignee: FIANIUM LIMITED,BAIRD, Brian W,GERKE, Timothy D
- Current Assignee: FIANIUM LIMITED,BAIRD, Brian W,GERKE, Timothy D
- Current Assignee Address: 20 Compass Point Ensign Way Hamble Southampton Hampshire SO31 4RA GB
- Agency: KENNEDY, Richard et al.
- Priority: US61/480,320 20110428; US61/477,946 20110421; US61/460,386 20101231; GB1014778.3 20100906; US61/380,306 20100906
- Main IPC: B23K26/073
- IPC: B23K26/073 ; B23K26/06 ; H01L31/18 ; H01L21/268
Abstract:
A picosecond laser beam shaping assembly is disclosed for shaping a picosecond laser beam for use in patterning (e.g., scribing) semiconductor devices. The assembly comprises a pulsed fibre laser source of picosecond laser pulses, a harmonic conversion element for converting laser pulses at a first laser wavelength having a first spectral bandwidth to laser pulses at a second laser wavelength having a second spectral bandwidth, and a beam shaping apparatus for shaping the laser beam at the second laser wavelength, the beam shaping apparatus having a spectral bandwidth that substantially corresponds to the second spectral bandwidth so as to produce a laser beam having a substantially rectangular cross-sectional profile.
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