Invention Application
WO2012041339A1 OPTICAL SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS AND METHOD OF REDUCING IMAGE PLACEMENT ERRORS
审中-公开
微型投影曝光装置的光学系统和减少图像放置误差的方法
- Patent Title: OPTICAL SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS AND METHOD OF REDUCING IMAGE PLACEMENT ERRORS
- Patent Title (中): 微型投影曝光装置的光学系统和减少图像放置误差的方法
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Application No.: PCT/EP2010/005901Application Date: 2010-09-28
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Publication No.: WO2012041339A1Publication Date: 2012-04-05
- Inventor: RUOFF, Johannes , NEUMANN, Jens Timo , ZIMMERMANN, Jörg , HELLWEG, Dirk , JÜRGENS, Dirk
- Applicant: CARL ZEISS SMT GMBH , RUOFF, Johannes , NEUMANN, Jens Timo , ZIMMERMANN, Jörg , HELLWEG, Dirk , JÜRGENS, Dirk
- Applicant Address: Rudolf-Eber-Strasse 2 73447 Oberkochen DE
- Assignee: CARL ZEISS SMT GMBH,RUOFF, Johannes,NEUMANN, Jens Timo,ZIMMERMANN, Jörg,HELLWEG, Dirk,JÜRGENS, Dirk
- Current Assignee: CARL ZEISS SMT GMBH,RUOFF, Johannes,NEUMANN, Jens Timo,ZIMMERMANN, Jörg,HELLWEG, Dirk,JÜRGENS, Dirk
- Current Assignee Address: Rudolf-Eber-Strasse 2 73447 Oberkochen DE
- Agency: SCHWANHÄUSSER, Gernot et al.
- Main IPC: G03F7/20
- IPC: G03F7/20
Abstract:
A method of reducing image placement errors in a microlithographic projection exposure apparatus comprises the steps of providing a mask (16), a light sensitive layer (22) and a microlithographic projection exposure apparatus (10) which images features (19) contained in the mask (16) onto the light sensitive surface (22) using projection light. In a next step image placement errors associated with an image of the features (10) formed on the light sensitive surface (22) are determined either by simulation or metrologically. Then an input state of polarization of the projection light is changed to an elliptical output state of polarization which is selected such that the image placement errors are reduced.
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