Invention Application
- Patent Title: PROFILE MEASURING APPARATUS, METHOD FOR MANUFACTURING STRUCTURE, AND STRUCTURE MANUFACTURING SYSTEM
- Patent Title (中): 型材测量装置，制造结构方法和结构制造系统
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Application No.: PCT/JP2011/074242Application Date: 2011-10-14
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Publication No.: WO2012057008A1Publication Date: 2012-05-03
- Inventor: KOMATSU, Manabu
- Applicant: NIKON CORPORATION , KOMATSU, Manabu
- Applicant Address: 12-1, Yurakucho 1-chome, Chiyoda-ku, Tokyo 1008331 JP
- Assignee: NIKON CORPORATION,KOMATSU, Manabu
- Current Assignee: NIKON CORPORATION,KOMATSU, Manabu
- Current Assignee Address: 12-1, Yurakucho 1-chome, Chiyoda-ku, Tokyo 1008331 JP
- Agency: KAWAKITA, Kijuro
- Priority: JP2010-240963 20101027
- Main IPC: G01B11/25
- IPC: G01B11/25
Abstract:
A profile measuring apparatus is provided to be capable of carrying out an optimal measurement for various objects, even provided with a gate -shaped frame structure, with an optical measuring probe. The profile measuring apparatus includes a projection unit which projects a pattern on the object from a projection direction; a measurement unit which takes an image of the pattern from a direction different from the projection direction to measure a position on a surface of the object based on an image data obtained with the taken image; an object - rotation unit which rotates the object in two directions; and a pattern - rotation unit which rotates the pattern.
Information query
