Invention Application
WO2012082092A1 INTER-DIE CONNECTION WITHIN AN INTEGRATED CIRCUIT FORMED OF A STACK OF CIRCUIT DIES
审中-公开
在形成电路堆叠的集成电路中的内部连接
- Patent Title: INTER-DIE CONNECTION WITHIN AN INTEGRATED CIRCUIT FORMED OF A STACK OF CIRCUIT DIES
- Patent Title (中): 在形成电路堆叠的集成电路中的内部连接
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Application No.: PCT/US2010/059996Application Date: 2010-12-13
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Publication No.: WO2012082092A1Publication Date: 2012-06-21
- Inventor: MCLAURIN, Teresa, Louise
- Applicant: ARM LIMITED , MCLAURIN, Teresa, Louise
- Applicant Address: 110 Fulbourn Road Cherry Hinton, Cambridge CB1 9NJ GB
- Assignee: ARM LIMITED,MCLAURIN, Teresa, Louise
- Current Assignee: ARM LIMITED,MCLAURIN, Teresa, Louise
- Current Assignee Address: 110 Fulbourn Road Cherry Hinton, Cambridge CB1 9NJ GB
- Agency: SPOONER, Stanley C.
- Main IPC: H01L25/065
- IPC: H01L25/065
Abstract:
An integrated circuit is formed of a plurality of circuit dies 22, 24 having through silicon vias (TSVs) passing there-through. The placement patterns of the through silicon vias differ between the circuit dies. An inter-die routing layer is provided either in a face of a substrate of one of the circuit dies or in an outer face of a layer of processing circuitry of one of the circuit dies. The inter-die routing layer bridges the gaps between the vias and the connection points of different circuit dies. The inter-die routing layer may be formed of metal tracks.
Information query
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